Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al[sub 2]O[sub 3] Thin Films

Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications

(2009) D. Hoogeland et al.   JOURNAL OF APPLIED PHYSICS

In situspectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

(2009) E Langereis et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

(2008) E. Langereis et al.   APPLIED PHYSICS LETTERS

High efficiency n-type Si solar cells on Al2O3-passivated boron emitters

(2008) Jan Benick et al.   APPLIED PHYSICS LETTERS

Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

(2008) Bongki Lee et al.   APPLIED PHYSICS LETTERS

Ultrahigh Capacitance Density for Multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon

(2008) J. H. Klootwijk et al.   IEEE ELECTRON DEVICE LETTERS

Silicon surface passivation by atomic layer deposited Al2O3

(2008) B. Hoex et al.   JOURNAL OF APPLIED PHYSICS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3

(2008) J. Schmidt et al.   PROGRESS IN PHOTOVOLTAICS