TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition

Published 2010 View Full Article

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Title
TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition
Authors
Keywords
-
Journal
MICROELECTRONIC ENGINEERING
Volume 88, Issue 5, Pages 646-650
Publisher
Elsevier BV
Online
2010-07-08
DOI
10.1016/j.mee.2010.06.037

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