Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

Atomic Layer Deposition of Ru/RuO2Thin Films Studied by In situ Infrared Spectroscopy

(2010) S. K. Park et al.   CHEMISTRY OF MATERIALS

Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene

(2010) Kaupo Kukli et al.   JOURNAL OF CRYSTAL GROWTH

Simulation at high temperature of atomic deposition, islands coalescence, Ostwald and inverse Ostwald ripening with a general simple kinetic Monte Carlo code

(2010) S. Lucas et al.   THIN SOLID FILMS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Large-Scale Synthesis of Few-Layered Graphene using CVD

(2009) Xianbao Wang et al.   CHEMICAL VAPOR DEPOSITION

Remote Plasma ALD of Platinum and Platinum Oxide Films

(2009) H. C. M. Knoops et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O[sub 2]

(2009) Tae-Kwang Eom et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Composition influence on the physical and electrical properties of SrxTi1−xOy-based metal-insulator-metal capacitors prepared by atomic layer deposition using TiN bottom electrodes

(2009) N. Menou et al.   JOURNAL OF APPLIED PHYSICS

Growth of Noble Metal Ru Thin Films by Liquid Injection Atomic Layer Deposition

(2009) Seong Keun Kim et al.   Journal of Physical Chemistry C

Synthesis and transport properties of SrTiO3−xNy/SrTiO3−δlayered structures produced by microwave-induced plasma nitridation

(2009) A Shkabko et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

High Temperature Atomic Layer Deposition of Ruthenium from N,N-Dimethyl-1-ruthenocenylethylamine

(2009) Kaupo Kukli et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Atomic Layer Deposition of Strontium Titanate Films Using Sr([sup t]Bu[sub 3]Cp)[sub 2] and Ti(OMe)[sub 4]

(2009) M. Popovici et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Alternative high-k dielectrics for semiconductor applications

(2009) S. Van Elshocht et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Characterization and properties of microwave plasma-treated SrTiO3

(2009) Andrey Shkabko et al.   MATERIALS CHEMISTRY AND PHYSICS

High κ for MIM and RRAM applications: Impact of the metallic electrode and oxygen vacancies

(2009) C. Vallée et al.   MICROELECTRONIC ENGINEERING

High-k dielectrics for future generation memory devices (Invited Paper)

(2009) J.A. Kittl et al.   MICROELECTRONIC ENGINEERING

Pulsed laser deposition and characterization of nitrogen-substituted SrTiO3 thin films

(2008) I. Marozau et al.   APPLIED SURFACE SCIENCE

Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications

(2008) H. C. M. Knoops et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

(2008) Sang-Joon Park et al.   THIN SOLID FILMS

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

(2007) Sang-Joon Park et al.   MICROELECTRONIC ENGINEERING