Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-k/Metal Gate Transistor

标题
Low-Temperature Silicon Oxide Offset Spacer Using Plasma-Enhanced Atomic Layer Deposition for High-k/Metal Gate Transistor
作者
关键词
-
出版物
JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 49, Issue 4, Pages 04DB11
出版商
Japan Society of Applied Physics
发表日期
2010-04-20
DOI
10.1143/jjap.49.04db11

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