Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N[sub 2] and N[sub 2]O Plasma Post-Treatments

标题
Characteristics of Thin Hf-Silicate Gate Dielectrics after Remote N[sub 2] and N[sub 2]O Plasma Post-Treatments
作者
关键词
-
出版物
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume 155, Issue 12, Pages G299
出版商
The Electrochemical Society
发表日期
2008-10-29
DOI
10.1149/1.2990702

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