Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor

标题
Atomic Layer Deposition of Copper Seed Layers from a (hfac)Cu(VTMOS) Precursor
作者
关键词
-
出版物
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 54, Issue 3, Pages 1330-1333
出版商
Korean Physical Society
发表日期
2009-06-26
DOI
10.3938/jkps.54.1330

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