The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD

标题
The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 257, Issue 8, Pages 3776-3779
出版商
Elsevier BV
发表日期
2010-11-30
DOI
10.1016/j.apsusc.2010.11.138

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