Electrical Properties of Atomic Layer Deposition HfO[sub 2] and HfO[sub x]N[sub y] on Si Substrates with Various Crystal Orientations

出版年份 2008 全文链接

标题

作者

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出版物

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Volume 155, Issue 4, Pages H267

出版商

The Electrochemical Society

发表日期

2008-03-08

DOI

10.1149/1.2840616

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY

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