Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition

标题
Influence of Substrates on the Nucleation and Growth Behaviors of Ge2Sb2Te5Films by Combined Plasma-Enhanced Atomic Layer and Chemical Vapor Deposition
作者
关键词
-
出版物
CHEMISTRY OF MATERIALS
Volume 21, Issue 12, Pages 2386-2396
出版商
American Chemical Society (ACS)
发表日期
2009-05-13
DOI
10.1021/cm803369b

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