Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO[sub 2]

出版年份 2009 全文链接

标题

Effects of Fluorine Plasma Treatment on the Electronic Structure of Plasma-Enhanced Atomic Layer Deposition HfO[sub 2]

作者

关键词

-

出版物

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Volume 156, Issue 5, Pages G33

出版商

The Electrochemical Society

发表日期

2009-04-01

DOI

10.1149/1.3089976

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