Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma andtert-Butylimido-tris(diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
Formation of Tantalum Carbide and Nitride Phases in Atomic Layer Deposition Using Hydrogen Plasma andtert-Butylimido-tris(diethylamido)-tantalum (TBTDET), and its Effect on Material Properties
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