Investigating the TiN Film Quality and Growth Behavior for Plasma-enhanced Atomic Layer Deposition Using TiCl$_4$ and N$_2$/H$_2$/Ar Radicals

标题
Investigating the TiN Film Quality and Growth Behavior for Plasma-enhanced Atomic Layer Deposition Using TiCl$_4$ and N$_2$/H$_2$/Ar Radicals
作者
关键词
-
出版物
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 57, Issue 4, Pages 806-811
出版商
Korean Physical Society
发表日期
2010-10-21
DOI
10.3938/jkps.57.806

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