Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation

标题
Atomic Layer Deposition of HfO2 Thin Films on Ultrathin SiO2 Formed by Remote Plasma Oxidation
作者
关键词
-
出版物
JOURNAL OF THE KOREAN PHYSICAL SOCIETY
Volume 52, Issue 4, Pages 1103-1108
出版商
Korean Physical Society
发表日期
2009-06-26
DOI
10.3938/jkps.52.1103

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