Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma

标题
Diffusion barrier properties of TaNx films prepared by plasma enhanced atomic layer deposition from PDMAT with N2 or NH3 plasma
作者
关键词
-
出版物
MICROELECTRONIC ENGINEERING
Volume 85, Issue 10, Pages 2059-2063
出版商
Elsevier BV
发表日期
2008-06-04
DOI
10.1016/j.mee.2008.05.026

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