Fabrication and Properties of AlN Film on GaN Substrate by Using Remote Plasma Atomic Layer Deposition Method

标题
Fabrication and Properties of AlN Film on GaN Substrate by Using Remote Plasma Atomic Layer Deposition Method
作者
关键词
-
出版物
Electronic Materials Letters
Volume 5, Issue 2, Pages 83-86
出版商
Springer Nature
发表日期
2009-07-15
DOI
10.3365/eml.2009.06.083

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