Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH[sub 3] Plasma

Nonvolatile memory characteristics of atomic layer deposited Ru nanocrystals with a SiO2/Al2O3 bilayered tunnel barrier

(2010) Do-Joong Lee et al.   JOURNAL OF APPLIED PHYSICS

Large-Scale Synthesis of Few-Layered Graphene using CVD

(2009) Xianbao Wang et al.   CHEMICAL VAPOR DEPOSITION

Low Temperature Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and O[sub 2]

(2009) Tae-Kwang Eom et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Formation of Ru Nanotubes by Atomic Layer Deposition onto an Anodized Aluminum Oxide Template

(2008) Do-Joong Lee et al.   ELECTROCHEMICAL AND SOLID STATE LETTERS

Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition

(2008) Sung-Soo Yim et al.   JOURNAL OF APPLIED PHYSICS

A Bilayer Diffusion Barrier of ALD-Ru/ALD-TaCN for Direct Plating of Cu

(2008) Soo-Hyun Kim et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Effect oxygen exposure on the quality of atomic layer deposition of ruthenium from bis(cyclopentadienyl)ruthenium and oxygen

(2008) Sang-Joon Park et al.   THIN SOLID FILMS

Applications of atomic layer deposition to nanofabrication and emerging nanodevices

(2008) Hyungjun Kim et al.   THIN SOLID FILMS

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

(2007) Sang-Joon Park et al.   MICROELECTRONIC ENGINEERING