Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition

标题
Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
作者
关键词
-
出版物
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 26, Issue 5, Pages 1251-1257
出版商
American Vacuum Society
发表日期
2008-09-13
DOI
10.1116/1.2966430

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