Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges
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Title
Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges
Authors
Keywords
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Journal
PROCEEDINGS OF THE IEEE
Volume 111, Issue 2, Pages 158-184
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2023-02-02
DOI
10.1109/jproc.2023.3234607
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