Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET: A material relation to device physics

Critical Role of Interlayer in Hf0.5Zr0.5O2 Ferroelectric FET Nonvolatile Memory Performance

(2018) Kai Ni et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Compact model of ferroelectric-gate field-effect transistor for circuit simulation based on multidomain Landau–Kalathnikov theory

(2017) Hidehiro Asai et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment

(2017) Min Hyuk Park et al.   Nanoscale

Effects of grain boundary and grain orientation on electrical behavior of polycrystalline ferroelectric field effect transistor

(2017) Fang Wang et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Ferroelectricity in undoped hafnium oxide

(2015) Patrick Polakowski et al.   APPLIED PHYSICS LETTERS

The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

(2015) R. Materlik et al.   JOURNAL OF APPLIED PHYSICS

Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

(2012) Stefan Mueller et al.   ADVANCED FUNCTIONAL MATERIALS

Electrical properties of ferroelectric-gate FETs with SrBi2Ta2O9 formed using MOCVD technique

(2012) Kang Yan et al.   APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

Ferroelectricity in Simple Binary ZrO2 and HfO2

(2012) Johannes Müller et al.   NANO LETTERS

Ferroelectricity in Gd-Doped HfO2Thin Films

(2012) S. Mueller et al.   ECS Journal of Solid State Science and Technology

Phase transitions in ferroelectric silicon doped hafnium oxide

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Ferroelectricity in yttrium-doped hafnium oxide

(2011) J. Müller et al.   JOURNAL OF APPLIED PHYSICS

Charge trapping properties of the HfO2 layer with various thicknesses for charge trap flash memory applications

(2010) Hee-Wook You et al.   APPLIED PHYSICS LETTERS

Electrical Characteristics of SiO$_{2}$/High-k Dielectric Stacked Tunnel Barriers for Nonvolatile Memory Applications

(2009) Goon-Ho Park et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

Permittivity enhancement of hafnium dioxide high-κ films by cerium doping

(2008) P. R. Chalker et al.   APPLIED PHYSICS LETTERS