Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Title
Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
Authors
Keywords
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Journal
ADVANCED MATERIALS
Volume 28, Issue 27, Pages 5586-5618
Publisher
Wiley
Online
2016-01-11
DOI
10.1002/adma.201503432

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