Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
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Title
Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application
Authors
Keywords
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Journal
ADVANCED MATERIALS
Volume 28, Issue 27, Pages 5586-5618
Publisher
Wiley
Online
2016-01-11
DOI
10.1002/adma.201503432
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