Plasma etch technologies for the development of ultra-small feature size transistor devices

Title
Plasma etch technologies for the development of ultra-small feature size transistor devices
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 44, Issue 17, Pages 174012
Publisher
IOP Publishing
Online
2011-04-15
DOI
10.1088/0022-3727/44/17/174012

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