“In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays
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Title
“In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays
Authors
Keywords
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Journal
Nanoscale
Volume 4, Issue 24, Pages 7743
Publisher
Royal Society of Chemistry (RSC)
Online
2012-10-26
DOI
10.1039/c2nr32693k
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