Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications

Published 2012 View Full Article

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Title
Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications
Authors
Keywords
-
Journal
ACS Nano
Volume 6, Issue 4, Pages 3424-3433
Publisher
American Chemical Society (ACS)
Online
2012-03-28
DOI
10.1021/nn300459r

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