Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography
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Title
Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography
Authors
Keywords
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Journal
MACROMOLECULAR RAPID COMMUNICATIONS
Volume 36, Issue 8, Pages 762-767
Publisher
Wiley
Online
2015-02-20
DOI
10.1002/marc.201400722
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