Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
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Title
Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
Authors
Keywords
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Journal
ADVANCED MATERIALS
Volume 27, Issue 29, Pages 4364-4370
Publisher
Wiley
Online
2015-06-19
DOI
10.1002/adma.201501585
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