An introduction to thin film processing using high-power impulse magnetron sputtering

Temporal Evolution of the Ion Fluxes for Various Elements in HIPIMS Plasma Discharge

(2011) Ante Hecimovic et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere

(2011) W P Leroy et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Study of plasma dynamics in a modulated pulsed power magnetron discharge using a time-resolved Langmuir probe

(2011) L. Meng et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Optimizing efficiency of Ti ionized deposition in HIPIMS

(2011) A E Ross et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

(2011) Montri Aiempanakit et al.   SURFACE & COATINGS TECHNOLOGY

Discharge physics of high power impulse magnetron sputtering

(2011) André Anders   SURFACE & COATINGS TECHNOLOGY

Studies of hysteresis effect in reactive HiPIMS deposition of oxides

(2011) T. Kubart et al.   SURFACE & COATINGS TECHNOLOGY

Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides

(2011) Montri Aiempanakit et al.   THIN SOLID FILMS

Compression and strong rarefaction in high power impulse magnetron sputtering discharges

(2010) David Horwat et al.   JOURNAL OF APPLIED PHYSICS

Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

(2010) J. Lazar et al.   JOURNAL OF APPLIED PHYSICS

The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate

(2010) Anurag Mishra et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Short- and long-term plasma phenomena in a HiPIMS discharge

(2010) P Poolcharuansin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Microstructure control of CrNx films during high power impulse magnetron sputtering

(2010) G. Greczynski et al.   SURFACE & COATINGS TECHNOLOGY

On the film density using high power impulse magnetron sputtering

(2010) Mattias Samuelsson et al.   SURFACE & COATINGS TECHNOLOGY

Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias

(2010) M. Lattemann et al.   THIN SOLID FILMS

The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool

(2010) J.T. Gudmundsson   VACUUM

On the electron energy in the high power impulse magnetron sputtering discharge

(2009) J. T. Gudmundsson et al.   JOURNAL OF APPLIED PHYSICS

On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering

(2009) J Alami et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Time evolution of ion energies in HIPIMS of chromium plasma discharge

(2009) A Hecimovic et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Energy flux measurements in high power impulse magnetron sputtering

(2009) Daniel Lundin et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Faster-than-Bohm Cross-BElectron Transport in Strongly Pulsed Plasmas

(2009) N. Brenning et al.   PHYSICAL REVIEW LETTERS

Measurements of Deposition Rate and Substrate Heating in a HiPIMS Discharge

(2009) Glen West et al.   Plasma Processes and Polymers

Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering

(2009) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering

(2009) J. Lin et al.   SURFACE & COATINGS TECHNOLOGY

Dual-magnetron open field sputtering system for sideways deposition of thin films

(2009) Asim Aijaz et al.   SURFACE & COATINGS TECHNOLOGY

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

(2009) K. Sarakinos et al.   SURFACE & COATINGS TECHNOLOGY

The Mn+1AXn phases: Materials science and thin-film processing

(2009) Per Eklund et al.   THIN SOLID FILMS

A structure zone diagram including plasma-based deposition and ion etching

(2009) André Anders   THIN SOLID FILMS

Observation of Ti4+ ions in a high power impulse magnetron sputtering plasma

(2008) Joakim Andersson et al.   APPLIED PHYSICS LETTERS

Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion

(2008) Joakim Andersson et al.   APPLIED PHYSICS LETTERS

Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions

(2008) André Anders   APPLIED PHYSICS LETTERS

Synthesis of α-Al2 O3 thin films using reactive high-power impulse magnetron sputtering

(2008) E. Wallin et al.   EPL

High power pulsed magnetron sputtering: Fundamentals and applications

(2008) J. Alami et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Calculation of gas heating in a dc sputter magnetron

(2008) I. Kolev et al.   JOURNAL OF APPLIED PHYSICS

Ion energy distributions and efficiency of sputtering process in HIPIMS system

(2008) K Burcalova et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Formation of TiOx films produced by high-power pulsed magnetron sputtering

(2008) Vítězslav Straňák et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering

(2008) J Alami et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Anomalous electron transport in high power impulse magnetron sputtering

(2008) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Cross-field ion transport during high power impulse magnetron sputtering

(2008) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide

(2008) K. Sarakinos et al.   SURFACE & COATINGS TECHNOLOGY

High power pulsed magnetron sputtering of transparent conducting oxides

(2007) V. Sittinger et al.   THIN SOLID FILMS

Hysteresis-free reactive high power impulse magnetron sputtering

(2007) E. Wallin et al.   THIN SOLID FILMS

The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering

(2007) Jens Emmerlich et al.   VACUUM