Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium
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Title
Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 108, Issue 6, Pages 063307
Publisher
AIP Publishing
Online
2010-09-29
DOI
10.1063/1.3481428
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Related references
Note: Only part of the references are listed.- Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer
- (2009) Efim Oks et al. JOURNAL OF APPLIED PHYSICS
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- (2009) André Anders et al. JOURNAL OF APPLIED PHYSICS
- Time evolution of ion energies in HIPIMS of chromium plasma discharge
- (2009) A Hecimovic et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Energy flux measurements in high power impulse magnetron sputtering
- (2009) Daniel Lundin et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator
- (2009) Joakim Andersson et al. PHYSICAL REVIEW LETTERS
- Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges
- (2009) A D Pajdarová et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Gasless sputtering: Opportunities for ultraclean metallization, coatings in space, and propulsion
- (2008) Joakim Andersson et al. APPLIED PHYSICS LETTERS
- Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions
- (2008) André Anders APPLIED PHYSICS LETTERS
- Erratum: “High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering” [J. Appl. Phys. 102, 113303 (2007)]
- (2008) André Anders et al. JOURNAL OF APPLIED PHYSICS
- Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper
- (2008) David Horwat et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering
- (2008) K Sarakinos et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Highly ionized fluxes of sputtered titanium atoms in high-power pulsed magnetron discharges
- (2008) P Kudláček et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- Study of a fast high power pulsed magnetron discharge: role of plasma deconfinement on the charged particle transport
- (2008) P Vašina et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- A bulk plasma model for dc and HiPIMS magnetrons
- (2008) N Brenning et al. PLASMA SOURCES SCIENCE & TECHNOLOGY
- High power pulsed magnetron sputtering of transparent conducting oxides
- (2007) V. Sittinger et al. THIN SOLID FILMS
- The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
- (2007) Jens Emmerlich et al. VACUUM
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