Investigation of HfO2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry
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Title
Investigation of HfO2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry
Authors
Keywords
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Journal
Crystals
Volume 8, Issue 6, Pages 248
Publisher
MDPI AG
Online
2018-06-12
DOI
10.3390/cryst8060248
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