Studies on RF magnetron sputtered HfO2 thin films for microelectronic applications

Electronic Properties of Thin HfO2Films Fabricated by Atomic Layer Deposition on 4H-SiC

(2016) A. Taube et al.   ACTA PHYSICA POLONICA A

Energy band alignment of atomic layer deposited HfO2 on epitaxial (110)Ge grown by molecular beam epitaxy

(2013) M. K. Hudait et al.   APPLIED PHYSICS LETTERS

Optimization of HfO2 films for high transconductance back gated graphene transistors

(2013) Kolla Lakshmi Ganapathi et al.   APPLIED PHYSICS LETTERS

High mobility graphene ion-sensitive field-effect transistors by noncovalent functionalization

(2013) W. Fu et al.   Nanoscale

Effect of sputtering gas on structural, optical and hydrophobic properties of DC-sputtered hafnium oxide thin films

(2013) V. Dave et al.   SURFACE & COATINGS TECHNOLOGY

Structural, Electrical and Dielectric Properties of Sputtered TiO2 Films for Al/TiO2/Si Capacitors

(2013) P. Kondaiah et al.   Science of Advanced Materials

Surface photovoltage and Auger electron spectromicroscopy studies of HfO2/SiO2/4H-SiC and HfO2/Al2O3/4H-SiC structures

(2012) A. Domanowska et al.   APPLIED SURFACE SCIENCE

Effect of hydrogen participation on the improvement in electrical characteristics of HfO2gate dielectrics by post-deposition remote N2, N2/H2, and NH3plasma treatments

(2012) Li-Tien Huang et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Integrations and challenges of novel high-k gate stacks in advanced CMOS technology

(2011) Gang He et al.   PROGRESS IN MATERIALS SCIENCE

Grain size and strain effects on the optical and electrical properties of hafnium oxide nanocrystalline thin films

(2010) K. Kamala Bharathi et al.   JOURNAL OF APPLIED PHYSICS

High-kHf-based layers grown by RF magnetron sputtering

(2010) L Khomenkova et al.   NANOTECHNOLOGY

Structure and optical properties of HfO2 thin films on silicon after rapid thermal annealing

(2009) Tingting Tan et al.   OPTICAL MATERIALS

Optical properties of MOCVD HfO2films

(2009) Boris Ayupov et al.   PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE

Effects of ozone oxidation on interfacial and dielectric properties of thin HfO2 films

(2008) L. Wang et al.   JOURNAL OF APPLIED PHYSICS

Amorphous hafnium oxide thin films for antireflection optical coatings

(2007) J.M. Khoshman et al.   SURFACE & COATINGS TECHNOLOGY

High k dielectrics for low temperature electronics

(2007) L. Pereira et al.   THIN SOLID FILMS