Impact of post deposition annealing in O2 ambient on structural properties of nanocrystalline hafnium oxide thin film

Optical characterization of hafnium oxide thin films for heat mirrors

(2015) M. Ramzan et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Impact of incorporated oxygen quantity on optical, structural and dielectric properties of reactive magnetron sputter grown high-κ HfO2/Hf/Si thin film

(2014) A. Cantas et al.   APPLIED SURFACE SCIENCE

Annealing temperature dependence on the structural and optical properties of sputtering-grown high-k HfO2 gate dielectrics

(2014) B. Deng et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Structure and optical properties of nanocrystalline hafnium oxide thin films

(2014) M. Vargas et al.   OPTICAL MATERIALS

RETRACTED: Structural, morphological, optical and photoluminescence properties of HfO 2 thin films

(2013) C.Y. Ma et al.   THIN SOLID FILMS

Synthesis, phase to phase deposition and characterization of rutile nanocrystalline titanium dioxide (TiO2) thin films

(2012) Sanjeev K. Gupta et al.   APPLIED SURFACE SCIENCE

Stress and texture development during sputtering of yttria, zirconia, and yttria stabilized zirconia films on Si substrates

(2012) K. V. L. V. Narayanachari et al.   JOURNAL OF APPLIED PHYSICS

High-isolation lateral RF MEMS capacitive switch based on HfO2 dielectric for high frequency applications

(2012) X.J. He et al.   SENSORS AND ACTUATORS A-PHYSICAL

The effect of nanocrystallite size in monoclinic HfO2 films on lattice expansion and near-edge optical absorption

(2010) M. C. Cisneros-Morales et al.   APPLIED PHYSICS LETTERS

Grain size and strain effects on the optical and electrical properties of hafnium oxide nanocrystalline thin films

(2010) K. Kamala Bharathi et al.   JOURNAL OF APPLIED PHYSICS

Study of the effect of thermal annealing on high k hafnium oxide thin film structure and electrical properties of MOS and MIM devices

(2010) A. Srivastava et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

High quality ITO thin films grown by dc and RF sputtering without oxygen

(2010) Ocal Tuna et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Improved thermal stability of nitrogen annealed sputtered hafnium oxide thin films for VLSI technology

(2010) R.K. Nahar et al.   MICROELECTRONICS INTERNATIONAL

Interfacial and structural properties of sputtered HfO2 layers

(2009) G. Aygun et al.   JOURNAL OF APPLIED PHYSICS

Properties of atomic layer deposited HfO2 thin films

(2009) Justin C. Hackley et al.   THIN SOLID FILMS