Amazing diffusion depth of ultra-thin hafnium oxide film grown on n-type silicon by lower temperature atomic layer deposition

Published 2016 View Full Article

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Title
Amazing diffusion depth of ultra-thin hafnium oxide film grown on n-type silicon by lower temperature atomic layer deposition
Authors
Keywords
HfO, 2, Hafnium silicide, Hafnium silicate, Diffusion depth, Tunnel contact
Journal
MATERIALS LETTERS
Volume 169, Issue -, Pages 164-167
Publisher
Elsevier BV
Online
2016-01-26
DOI
10.1016/j.matlet.2016.01.087

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