Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition

Title
Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
Authors
Keywords
Atomic layer deposition, Resistive random access memory, Bottom electrode, Resistive switching parameters, Oxygen vacancy concentration, Trilayer structure
Journal
Nanoscale Research Letters
Volume 12, Issue 1, Pages -
Publisher
Springer Nature
Online
2017-06-08
DOI
10.1186/s11671-017-2164-z

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