Special topic on ferroelectricity in hafnium oxide: Materials and devices

Ab initio interphase characteristics in HfO2 and ZrO2 and nucleation of the polar phase

(2021) Max Falkowski et al.   APPLIED PHYSICS LETTERS

Thermal retention of atomic layer deposited Hf0.5Zr0.502 films using H2O and O2–H2 plasma oxidation methods

(2021) Glen Walters et al.   APPLIED PHYSICS LETTERS

Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO2 films

(2021) Lutz Baumgarten et al.   APPLIED PHYSICS LETTERS

Ferroelectricity of as-deposited HZO fabricated by plasma-enhanced atomic layer deposition at 300 °C by inserting TiO2 interlayers

(2021) Yuanshen Qi et al.   APPLIED PHYSICS LETTERS

Impact of the SiO2 interface layer on the crystallographic texture of ferroelectric hafnium oxide

(2021) M. Lederer et al.   APPLIED PHYSICS LETTERS

Unexpectedly large remanent polarization of Hf0.5Zr0.5O2 metal–ferroelectric–metal capacitor fabricated without breaking vacuum

(2021) Younghwan Lee et al.   APPLIED PHYSICS LETTERS

Doping concentration dependent piezoelectric behavior of Si:HfO2 thin-films

(2021) S. Kirbach et al.   APPLIED PHYSICS LETTERS

Nonlinear domain wall velocity in ferroelectric Si-doped HfO2 thin film capacitors

(2021) So Yeon Lim et al.   APPLIED PHYSICS LETTERS

Electroresistance effect in MoS2-Hf0.5Zr0.5O2 heterojunctions

(2021) P. Chaudhary et al.   APPLIED PHYSICS LETTERS

In situ heating studies on temperature-induced phase transitions in epitaxial Hf0.5Zr0.5O2/La0.67Sr0.33MnO3 heterostructures

(2021) Pavan Nukala et al.   APPLIED PHYSICS LETTERS

Imprint issue during retention tests for HfO2-based FRAM: An industrial challenge?

(2021) J. Bouaziz et al.   APPLIED PHYSICS LETTERS

Ferroelectric polarization retention with scaling of Hf0.5Zr0.5O2 on silicon

(2021) Jaidah Mohan et al.   APPLIED PHYSICS LETTERS

Impact of area scaling on the ferroelectric properties of back-end of line compatible Hf0.5Zr0.5O2 and Si:HfO2-based MFM capacitors

(2021) T. Francois et al.   APPLIED PHYSICS LETTERS

Elucidating possible crystallographic origins of wake-up mechanisms in ferroelectric hafnia

(2021) Sean R. C. McMitchell et al.   APPLIED PHYSICS LETTERS

Identification of structural phases in ferroelectric hafnium zirconium oxide by density-functional-theory-assisted EXAFS analysis

(2021) Mehmet Alper Sahiner et al.   APPLIED PHYSICS LETTERS

Solution processed high performance ferroelectric Hf0.5Zr0.5O2 thin film transistor on glass substrate

(2021) Md. Mehedi Hasan et al.   APPLIED PHYSICS LETTERS

Differential charge boost in hysteretic ferroelectric–dielectric heterostructure capacitors at steady state

(2021) Nujhat Tasneem et al.   APPLIED PHYSICS LETTERS

The Past, the Present, and the Future of Ferroelectric Memories

(2020) T. Mikolajick et al.   IEEE TRANSACTIONS ON ELECTRON DEVICES

Enhanced ferroelectricity in ultrathin films grown directly on silicon

(2020) Suraj S. Cheema et al.   NATURE

Interface chemistry of pristine TiN/La: Hf 0.5 Zr 0.5 O 2 capacitors

(2020) W. Hamouda et al.   APPLIED PHYSICS LETTERS

The electrocaloric effect in doped hafnium oxide: Comparison of direct and indirect measurements

(2020) C. Mart et al.   APPLIED PHYSICS LETTERS

Study of ferroelectric characteristics of Hf0.5Zr0.5O2 thin films grown on sputtered or atomic-layer-deposited TiN bottom electrodes

(2020) Beom Yong Kim et al.   APPLIED PHYSICS LETTERS

Evaluation of polarization characteristics in metal/ferroelectric/semiconductor capacitors and ferroelectric field-effect transistors

(2020) Kasidit Toprasertpong et al.   APPLIED PHYSICS LETTERS

Excitation of high-frequency in-plane bulk acoustic resonance modes in geometrically engineered hafnium zirconium oxide nano-electro-mechanical membrane

(2020) F. Hakim et al.   APPLIED PHYSICS LETTERS

A Gibbs energy view of double hysteresis in ZrO2 and Si-doped HfO2

(2020) Patrick D. Lomenzo et al.   APPLIED PHYSICS LETTERS

Fatigue and retention in the growth window of ferroelectric Hf0.5Zr0.5O2 thin films

(2020) Jike Lyu et al.   APPLIED PHYSICS LETTERS

Electric field cycling-mediated variations in defect distributions associated with wake-up and split-up behaviors of a ferroelectric Si-doped HfO2 thin film

(2020) Myeong Seop Song et al.   APPLIED PHYSICS LETTERS

Impact of oxygen vacancy on the ferroelectric properties of lanthanum-doped hafnium oxide

(2020) Damir R. Islamov et al.   APPLIED PHYSICS LETTERS

Charge transport mechanism in La:HfO2

(2020) V. A. Gritsenko et al.   APPLIED PHYSICS LETTERS

A memory window expression to evaluate the endurance of ferroelectric FETs

(2020) Nicolò Zagni et al.   APPLIED PHYSICS LETTERS

Dielectric, energy storage, and loss study of antiferroelectric-like Al-doped HfO2 thin films

(2020) Alexis Payne et al.   APPLIED PHYSICS LETTERS

Reliability aspects of ferroelectric TiN/Hf0.5Zr0.5O2/Ge capacitors grown by plasma assisted atomic oxygen deposition

(2020) C. Zacharaki et al.   APPLIED PHYSICS LETTERS

Improvement of remanent polarization of CeO2–HfO2 solid solution thin films on Si substrates by chemical solution deposition

(2020) Shuaizhi Zheng et al.   APPLIED PHYSICS LETTERS

A first-principles study on ferroelectric phase formation of Si-doped HfO2 through nucleation and phase transition in thermal process

(2020) Jixuan Wu et al.   APPLIED PHYSICS LETTERS

TiN/Gd:HfO2/TiN capacitors grown by PEALD showing high endurance ferroelectric switching

(2020) S. Belahcen et al.   APPLIED PHYSICS LETTERS

Improvement in ferroelectricity and breakdown voltage of over 20-nm-thick HfxZr1−xO2/ZrO2 bilayer by atomic layer deposition

(2020) Takashi Onaya et al.   APPLIED PHYSICS LETTERS

A method for estimating defects in ferroelectric thin film MOSCAPs

(2020) Anton E. O. Persson et al.   APPLIED PHYSICS LETTERS

Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf0.5Zr0.5O2 films

(2020) Vineetha Mukundan et al.   APPLIED PHYSICS LETTERS

Identifying alternative ferroelectric materials beyond Hf(Zr)O2

(2020) Jing Guo et al.   APPLIED PHYSICS LETTERS

Defect profiling in FEFET Si:HfO2 layers

(2020) B. J. O'Sullivan et al.   APPLIED PHYSICS LETTERS

A perspective on semiconductor devices based on fluorite-structured ferroelectrics from the materials–device integration perspective

(2020) Ju Yong Park et al.   JOURNAL OF APPLIED PHYSICS

Mitigating wakeup effect and improving endurance of ferroelectric HfO2-ZrO2 thin films by careful La-doping

(2019) Maxim G. Kozodaev et al.   JOURNAL OF APPLIED PHYSICS

Fluorite-structure antiferroelectrics

(2019) Min Hyuk Park et al.   REPORTS ON PROGRESS IN PHYSICS

Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors

(2018) Thomas Mikolajick et al.   MRS BULLETIN

Review and perspective on ferroelectric HfO2-based thin films for memory applications

(2018) Min Hyuk Park et al.   MRS Communications

A rhombohedral ferroelectric phase in epitaxially strained Hf0.5Zr0.5O2 thin films

(2018) Yingfen Wei et al.   NATURE MATERIALS

Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides

(2018) Min Hyuk Park et al.   Advanced Electronic Materials

Identification of the nature of traps involved in the field cycling of Hf0.5Zr0.5O2-based ferroelectric thin films

(2018) Damir R. Islamov et al.   ACTA MATERIALIA

Understanding the formation of the metastable ferroelectric phase in hafnia–zirconia solid solution thin films

(2017) Min Hyuk Park et al.   Nanoscale

Stabilization of metastable phases in hafnia owing to surface energy effects

(2016) Rohit Batra et al.   APPLIED PHYSICS LETTERS

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films

(2015) Min Hyuk Park et al.   ADVANCED MATERIALS

On the structural origins of ferroelectricity in HfO2 thin films

(2015) Xiahan Sang et al.   APPLIED PHYSICS LETTERS

The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

(2015) R. Materlik et al.   JOURNAL OF APPLIED PHYSICS

Ferroelectric phase transitions in nanoscale HfO 2 films enable giant pyroelectric energy conversion and highly efficient supercapacitors

(2015) Michael Hoffmann et al.   Nano Energy

Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric Hf x Zr 1−x O 2 films

(2015) Min Hyuk Park et al.   Nano Energy

Pathways towards ferroelectricity in hafnia

(2014) Tran Doan Huan et al.   PHYSICAL REVIEW B

Thin HfxZr1-xO2Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

(2014) Min Hyuk Park et al.   Advanced Energy Materials

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale Devices

(2007) Sayeef Salahuddin et al.   NANO LETTERS