Study of ferroelectric characteristics of Hf0.5Zr0.5O2 thin films grown on sputtered or atomic-layer-deposited TiN bottom electrodes

标题
Study of ferroelectric characteristics of Hf0.5Zr0.5O2 thin films grown on sputtered or atomic-layer-deposited TiN bottom electrodes
作者
关键词
-
出版物
APPLIED PHYSICS LETTERS
Volume 117, Issue 2, Pages 022902
出版商
AIP Publishing
发表日期
2020-07-14
DOI
10.1063/5.0011663

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