A perspective on semiconductor devices based on fluorite-structured ferroelectrics from the materials–device integration perspective
出版年份 2020 全文链接
标题
A perspective on semiconductor devices based on fluorite-structured ferroelectrics from the materials–device integration perspective
作者
关键词
-
出版物
JOURNAL OF APPLIED PHYSICS
Volume 128, Issue 24, Pages 240904
出版商
AIP Publishing
发表日期
2020-12-28
DOI
10.1063/5.0035542
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Synergistic Improvement of Long‐Term Plasticity in Photonic Synapses Using Ferroelectric Polarization in Hafnia‐Based Oxide‐Semiconductor Transistors
- (2020) Min‐Kyu Kim et al. ADVANCED MATERIALS
- Thickness- and orientation- dependences of Curie temperature in ferroelectric epitaxial Y doped HfO2 films
- (2020) Takanori Mimura et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- The effects of thin film homogeneity on the performance of ferroelectric tunnel junctions
- (2020) A Dörfler et al. JOURNAL OF PHYSICS-CONDENSED MATTER
- Memristor with a ferroelectric HfO2 layer: In which case it is a ferroelectric tunnel junction
- (2020) Vitalii Mikheev et al. NANOTECHNOLOGY
- Hf0.5Zr0.5O2-based ferroelectric bionic electronic synapse device with highly symmetrical and linearity weight modification
- (2020) Tian Guoliang et al. ELECTRONICS LETTERS
- Effect of wake-up on the polarization switching dynamics of Si doped HfO2 thin films with imprint
- (2020) Min Chul Chun et al. JOURNAL OF ALLOYS AND COMPOUNDS
- Enhanced ferroelectricity in ultrathin films grown directly on silicon
- (2020) Suraj S. Cheema et al. NATURE
- Blocking of Conducting Channels Widens Window for Ferroelectric Resistive Switching in Interface‐Engineered Hf 0.5 Zr 0.5 O 2 Tunnel Devices
- (2020) Milena Cervo Sulzbach et al. ADVANCED FUNCTIONAL MATERIALS
- Effect of Forming Gas High-Pressure Annealing on Metal-Ferroelectric-Semiconductor Hafnia Ferroelectric Tunnel Junction
- (2020) Junghyeon Hwang et al. IEEE ELECTRON DEVICE LETTERS
- Interplay Between Switching and Retention in HfO2-Based Ferroelectric FETs
- (2020) Halid Mulaosmanovic et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Data retention and low voltage operation of Al2O3/Hf0.5Zr0.5O2 based ferroelectric tunnel junctions
- (2020) Aniruddh Shekhawat et al. NANOTECHNOLOGY
- Scale-free ferroelectricity induced by flat phonon bands in HfO2
- (2020) Hyun-Jae Lee et al. SCIENCE
- Supervised Learning in All FeFET-Based Spiking Neural Network: Opportunities and Challenges
- (2020) Sourav Dutta et al. Frontiers in Neuroscience
- Mitigating wakeup effect and improving endurance of ferroelectric HfO2-ZrO2 thin films by careful La-doping
- (2019) Maxim G. Kozodaev et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectric negative capacitance
- (2019) Jorge Íñiguez et al. Nature Reviews Materials
- What Will Come After V-NAND-Vertical Resistive Switching Memory?
- (2019) Kyung Jean Yoon et al. Advanced Electronic Materials
- Ferroelectric Analog Synaptic Transistors
- (2019) Min-Kyu Kim et al. NANO LETTERS
- A critical review of recent progress on negative capacitance field-effect transistors
- (2019) Muhammad A. Alam et al. APPLIED PHYSICS LETTERS
- Low power, ultrafast synaptic plasticity in 1R-ferroelectric tunnel memristive structure for spiking neural networks
- (2019) F. Zayer et al. AEU-INTERNATIONAL JOURNAL OF ELECTRONICS AND COMMUNICATIONS
- Program/Erase Cycling Degradation Mechanism of HfO2-Based FeFET Memory Devices
- (2019) Binjian Zeng et al. IEEE ELECTRON DEVICE LETTERS
- Broad Phase Transition of Fluorite‐Structured Ferroelectrics for Large Electrocaloric Effect
- (2019) Min Hyuk Park et al. Physica Status Solidi-Rapid Research Letters
- Origin of Ferroelectric Phase in Undoped HfO 2 Films Deposited by Sputtering
- (2019) Terence Mittmann et al. Advanced Materials Interfaces
- Formation of the orthorhombic phase in CeO2-HfO2 solid solution epitaxial thin films and their ferroelectric properties
- (2019) T. Shiraishi et al. APPLIED PHYSICS LETTERS
- Ferroelectric Second-Order Memristor
- (2019) Vitalii Mikheev et al. ACS Applied Materials & Interfaces
- Fluid Imprint and Inertial Switching in Ferroelectric La:HfO2 Capacitors
- (2019) Pratyush Buragohain et al. ACS Applied Materials & Interfaces
- Ferroelectric FETs With 20-nm-Thick HfO2 Layer for Large Memory Window and High Performance
- (2019) Halid Mulaosmanovic et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Fluorite-structure antiferroelectrics
- (2019) Min Hyuk Park et al. REPORTS ON PROGRESS IN PHYSICS
- On the Origin of the Large Remanent Polarization in La:HfO 2
- (2019) Tony Schenk et al. Advanced Electronic Materials
- Ferroelectric materials for neuromorphic computing
- (2019) S. Oh et al. APL Materials
- Stable Subloop Behavior in Ferroelectric Si-Doped HfO2
- (2019) Kyoungjun Lee et al. ACS Applied Materials & Interfaces
- Understanding tunneling electroresistance effect through potential profile in Pt/Hf0.5Zr0.5O2/TiN ferroelectric tunnel junction memory
- (2019) Jungkyu Yoon et al. APPLIED PHYSICS LETTERS
- Unraveling Ferroelectric Polarization and Ionic Contributions to Electroresistance in Epitaxial Hf 0.5 Zr 0.5 O 2 Tunnel Junctions
- (2019) Milena Cervo Sulzbach et al. Advanced Electronic Materials
- Ferroelectric Tunneling Junctions Based on Aluminum Oxide/ Zirconium-Doped Hafnium Oxide for Neuromorphic Computing
- (2019) Hojoon Ryu et al. Scientific Reports
- A comprehensive study on the mechanism of ferroelectric phase formation in hafnia-zirconia nanolaminates and superlattices
- (2019) Min Hyuk Park et al. Applied Physics Reviews
- Improved Ferroelectric Switching Endurance of La-Doped Hf0.5Zr0.5O2 Thin Films
- (2018) Anna G. Chernikova et al. ACS Applied Materials & Interfaces
- Nanoscopic studies of domain structure dynamics in ferroelectric La:HfO2 capacitors
- (2018) P. Buragohain et al. APPLIED PHYSICS LETTERS
- Evolution of ferroelectric HfO2 in ultrathin region down to 3 nm
- (2018) Xuan Tian et al. APPLIED PHYSICS LETTERS
- A Study of Endurance Issues in HfO2-Based Ferroelectric Field Effect Transistors: Charge Trapping and Trap Generation
- (2018) Nanbo Gong et al. IEEE ELECTRON DEVICE LETTERS
- Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
- (2018) Uwe Schroeder et al. INORGANIC CHEMISTRY
- Doped ZrO2 for future lead free piezoelectric devices
- (2018) S. Starschich et al. JOURNAL OF APPLIED PHYSICS
- Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO2: A first principles study
- (2018) Robin Materlik et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
- (2018) Thomas Mikolajick et al. MRS BULLETIN
- The effect of the bottom electrode on ferroelectric tunnel junctions based on CMOS-compatible HfO2
- (2018) Youngin Goh et al. NANOTECHNOLOGY
- Neuro-Inspired Computing With Emerging Nonvolatile Memorys
- (2018) Shimeng Yu PROCEEDINGS OF THE IEEE
- Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO2
- (2018) Everett D. Grimley et al. Advanced Materials Interfaces
- Enhanced tunneling electroresistance effects in HfZrO-based ferroelectric tunnel junctions by high-pressure nitrogen annealing
- (2018) Youngin Goh et al. APPLIED PHYSICS LETTERS
- Thickness-dependent crystal structure and electric properties of epitaxial ferroelectric Y2O3-HfO2 films
- (2018) Takanori Mimura et al. APPLIED PHYSICS LETTERS
- High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty
- (2018) T. Ali et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Ferroelectric Hf0.5Zr0.5O2 Thin Films: A Review of Recent Advances
- (2018) Si Joon Kim et al. JOM
- A ferroelectric field effect transistor based synaptic weight cell
- (2018) Matthew Jerry et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Ultra-low power Hf0.5Zr0.5O2 based ferroelectric tunnel junction synapses for hardware neural network applications
- (2018) Lin Chen et al. Nanoscale
- Review and perspective on ferroelectric HfO2-based thin films for memory applications
- (2018) Min Hyuk Park et al. MRS Communications
- Morphotropic Phase Boundary of Hf1–xZrxO2 Thin Films for Dynamic Random Access Memories
- (2018) Min Hyuk Park et al. ACS Applied Materials & Interfaces
- Ferroelectric Polarization-Switching Dynamics and Wake-Up Effect in Si-Doped HfO2
- (2018) Tae Yoon Lee et al. ACS Applied Materials & Interfaces
- A perspective on steep-subthreshold-slope negative-capacitance field-effect transistor
- (2018) Masaharu Kobayashi Applied Physics Express
- Ferroelectric FETs-Based Nonvolatile Logic-in-Memory Circuits
- (2018) Xunzhao Yin et al. IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS
- Thermodynamic and Kinetic Origins of Ferroelectricity in Fluorite Structure Oxides
- (2018) Min Hyuk Park et al. Advanced Electronic Materials
- Recovery of Cycling Endurance Failure in Ferroelectric FETs by Self-Heating
- (2018) Halid Mulaosmanovic et al. IEEE ELECTRON DEVICE LETTERS
- Reliability Study of Ferroelectric Al:HfO2 Thin Films for DRAM and NAND Applications
- (2017) Karine Florent et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Kinetic pathway of the ferroelectric phase formation in doped HfO2 films
- (2017) Lun Xu et al. JOURNAL OF APPLIED PHYSICS
- Factors Favoring Ferroelectricity in Hafnia: A First-Principles Computational Study
- (2017) Rohit Batra et al. Journal of Physical Chemistry C
- Electron transport across ultrathin ferroelectric Hf 0.5 Zr 0.5 O 2 films on Si
- (2017) A. Chouprik et al. MICROELECTRONIC ENGINEERING
- Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
- (2017) Min Hyuk Park et al. Nanoscale
- A comprehensive study on the structural evolution of HfO2 thin films doped with various dopants
- (2017) M. H. Park et al. Journal of Materials Chemistry C
- Scale-up and optimization of HfO 2 -ZrO 2 solid solution thin films for the electrostatic supercapacitors
- (2017) Keum Do Kim et al. Nano Energy
- Effect of acceptor doping on phase transitions of HfO 2 thin films for energy-related applications
- (2017) Min Hyuk Park et al. Nano Energy
- Si Doped Hafnium Oxide-A “Fragile” Ferroelectric System
- (2017) Claudia Richter et al. Advanced Electronic Materials
- Domain Pinning: Comparison of Hafnia and PZT Based Ferroelectrics
- (2017) Franz P. G. Fengler et al. Advanced Electronic Materials
- Understanding the formation of the metastable ferroelectric phase in hafnia–zirconia solid solution thin films
- (2017) Min Hyuk Park et al. Nanoscale
- Effect of Zr Content on the Wake-Up Effect in Hf1–xZrxO2 Films
- (2016) Min Hyuk Park et al. ACS Applied Materials & Interfaces
- Ultrathin Hf0.5Zr0.5O2 Ferroelectric Films on Si
- (2016) Anna Chernikova et al. ACS Applied Materials & Interfaces
- Nonvolatile Random Access Memory and Energy Storage Based on Antiferroelectric Like Hysteresis in ZrO2
- (2016) Milan Pešić et al. ADVANCED FUNCTIONAL MATERIALS
- Physical Mechanisms behind the Field-Cycling Behavior of HfO2 -Based Ferroelectric Capacitors
- (2016) Milan Pešić et al. ADVANCED FUNCTIONAL MATERIALS
- Ferroelectric phase stabilization of HfO2by nitrogen doping
- (2016) Lun Xu et al. Applied Physics Express
- Stabilization of metastable phases in hafnia owing to surface energy effects
- (2016) Rohit Batra et al. APPLIED PHYSICS LETTERS
- Growth of (111)-oriented epitaxial and textured ferroelectric Y-doped HfO2 films for downscaled devices
- (2016) Kiliha Katayama et al. APPLIED PHYSICS LETTERS
- Ferroelectricity and ferroelectric resistive switching in sputtered Hf0.5Zr0.5O2 thin films
- (2016) Zhen Fan et al. APPLIED PHYSICS LETTERS
- Correlation between the macroscopic ferroelectric material properties of Si:HfO2and the statistics of 28 nm FeFET memory arrays
- (2016) S. Mueller et al. FERROELECTRICS
- Why Is FE–HfO2More Suitable Than PZT or SBT for Scaled Nonvolatile 1-T Memory Cell? A Retention Perspective
- (2016) Nanbo Gong et al. IEEE ELECTRON DEVICE LETTERS
- Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories
- (2016) Ekaterina Yurchuk et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Ferroelectricity of nondoped thin HfO2films in TiN/HfO2/TiN stacks
- (2016) Tomonori Nishimura et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Scaling Effects in Perovskite Ferroelectrics: Fundamental Limits and Process-Structure-Property Relations
- (2016) Jon F. Ihlefeld et al. JOURNAL OF THE AMERICAN CERAMIC SOCIETY
- A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2films by pulse-switching measurement
- (2016) Han Joon Kim et al. Nanoscale
- The demonstration of significant ferroelectricity in epitaxial Y-doped HfO2 film
- (2016) Takao Shimizu et al. Scientific Reports
- Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition
- (2016) K. D. Kim et al. Journal of Materials Chemistry C
- Neuromorphic Computing: Memristors for Energy-Efficient New Computing Paradigms (Adv. Electron. Mater. 9/2016)
- (2016) Doo Seok Jeong et al. Advanced Electronic Materials
- Structural Changes Underlying Field-Cycling Phenomena in Ferroelectric HfO2Thin Films
- (2016) Everett D. Grimley et al. Advanced Electronic Materials
- Complex Internal Bias Fields in Ferroelectric Hafnium Oxide
- (2015) Tony Schenk et al. ACS Applied Materials & Interfaces
- Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
- (2015) Min Hyuk Park et al. ADVANCED MATERIALS
- Study on the size effect in Hf0.5Zr0.5O2 films thinner than 8 nm before and after wake-up field cycling
- (2015) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Ferroelectricity in undoped hafnium oxide
- (2015) Patrick Polakowski et al. APPLIED PHYSICS LETTERS
- On the structural origins of ferroelectricity in HfO2 thin films
- (2015) Xiahan Sang et al. APPLIED PHYSICS LETTERS
- TaN interface properties and electric field cycling effects on ferroelectric Si-doped HfO2 thin films
- (2015) Patrick D. Lomenzo et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects
- (2015) J. Muller et al. ECS Journal of Solid State Science and Technology
- Ferroelectric phase transitions in nanoscale HfO 2 films enable giant pyroelectric energy conversion and highly efficient supercapacitors
- (2015) Michael Hoffmann et al. Nano Energy
- Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric Hf x Zr 1−x O 2 films
- (2015) Min Hyuk Park et al. Nano Energy
- Prospective of Semiconductor Memory Devices: from Memory System to Materials
- (2015) Cheol Seong Hwang Advanced Electronic Materials
- Electric Field Cycling Behavior of Ferroelectric Hafnium Oxide
- (2014) Tony Schenk et al. ACS Applied Materials & Interfaces
- Ferroelectricity in Si-Doped HfO2Revealed: A Binary Lead-Free Ferroelectric
- (2014) Dominik Martin et al. ADVANCED MATERIALS
- The effects of layering in ferroelectric Si-doped HfO2 thin films
- (2014) Patrick D. Lomenzo et al. APPLIED PHYSICS LETTERS
- Impact of Scaling on the Performance of HfO2-Based Ferroelectric Field Effect Transistors
- (2014) Ekaterina Yurchuk et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Impact of different dopants on the switching properties of ferroelectric hafniumoxide
- (2014) Uwe Schroeder et al. JAPANESE JOURNAL OF APPLIED PHYSICS
- Antiferroelectricity in thin-filmZrO2from first principles
- (2014) Sebastian E. Reyes-Lillo et al. PHYSICAL REVIEW B
- Ferroelectric tunnel junctions for information storage and processing
- (2014) Vincent Garcia et al. Nature Communications
- Thin HfxZr1-xO2Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability
- (2014) Min Hyuk Park et al. Advanced Energy Materials
- Wake-up effects in Si-doped hafnium oxide ferroelectric thin films
- (2013) Dayu Zhou et al. APPLIED PHYSICS LETTERS
- Effect of forming gas annealing on the ferroelectric properties of Hf0.5Zr0.5O2 thin films with and without Pt electrodes
- (2013) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature
- (2013) Min Hyuk Park et al. APPLIED PHYSICS LETTERS
- From MFM Capacitors Toward Ferroelectric Transistors: Endurance and Disturb Characteristics of ${\rm HfO}_{2}$-Based FeFET Devices
- (2013) Stefan Mueller et al. IEEE TRANSACTIONS ON ELECTRON DEVICES
- Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO2
- (2013) Dominik Martin et al. SOLID-STATE ELECTRONICS
- Incipient Ferroelectricity in Al-Doped HfO2 Thin Films
- (2012) Stefan Mueller et al. ADVANCED FUNCTIONAL MATERIALS
- Nanosecond Polarization Switching and Long Retention in a Novel MFIS-FET Based on Ferroelectric $\hbox{HfO}_{2}$
- (2012) Johannes Muller et al. IEEE ELECTRON DEVICE LETTERS
- Ferroelectricity in Simple Binary ZrO2 and HfO2
- (2012) Johannes Müller et al. NANO LETTERS
- A ferroelectric memristor
- (2012) André Chanthbouala et al. NATURE MATERIALS
- Sub-Picosecond Processes of Ferroelectric Domain Switching from Field and Temperature Experiments
- (2011) An Quan Jiang et al. ADVANCED FUNCTIONAL MATERIALS
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Polarization switching and discharging behaviors in serially connected ferroelectric Pt/Pb(Zr,Ti)O3/Pt and paraelectric capacitors
- (2011) Hyun Ju Lee et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectricity in yttrium-doped hafnium oxide
- (2011) J. Müller et al. JOURNAL OF APPLIED PHYSICS
- Solid-state memories based on ferroelectric tunnel junctions
- (2011) André Chanthbouala et al. Nature Nanotechnology
- Polarization reversal behavior in the Pt/Pb(Zr,Ti)O3/Pt and Pt/Al2O3/Pb(Zr,Ti)O3/Pt capacitors for different reversal directions
- (2010) Hyun Ju Lee et al. APPLIED PHYSICS LETTERS
- Experimental and theoretical investigation on polarization reversal in unfatigued lead-zirconate-titanate ceramic
- (2010) Sergey Zhukov et al. JOURNAL OF APPLIED PHYSICS
- Ferroelectric Control of Spin Polarization
- (2010) V. Garcia et al. SCIENCE
- Recent Progress of Ferroelectric-Gate Field-Effect Transistors and Applications to Nonvolatile Logic and FeNAND Flash Memory
- (2010) Shigeki Sakai et al. Materials
- The Inlaid Al2O3Tunnel Switch for Ultrathin Ferroelectric Films
- (2009) An Quan Jiang et al. ADVANCED MATERIALS
- Perspective on the Development of Lead-free Piezoceramics
- (2009) Jürgen Rödel et al. JOURNAL OF THE AMERICAN CERAMIC SOCIETY
- Giant tunnel electroresistance for non-destructive readout of ferroelectric states
- (2009) V. Garcia et al. NATURE
- Resolving the Landauer paradox in ferroelectric switching by high-field charge injection
- (2009) An-Quan Jiang et al. PHYSICAL REVIEW B
- A Strain-Driven Morphotropic Phase Boundary in BiFeO3
- (2009) R. J. Zeches et al. SCIENCE
- Operational method of a ferroelectric (Fe)-NAND flash memory array
- (2009) Shouyu Wang et al. SEMICONDUCTOR SCIENCE AND TECHNOLOGY
- Origin of morphotropic phase boundaries in ferroelectrics
- (2008) Muhtar Ahart et al. NATURE
Find Funding. Review Successful Grants.
Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.
ExploreCreate your own webinar
Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.
Create Now