A review: green chemical mechanical polishing for metals and brittle wafers

Chemical mechanical polishing for sapphire wafers using a developed slurry

(2021) Zhenyu Zhang et al.   Journal of Manufacturing Processes

Effects of polishing parameters on surface quality in sapphire double-sided CMP

(2020) Zhongyang Li et al.   CERAMICS INTERNATIONAL

Wafer-scale single-crystal hexagonal boron nitride monolayers on Cu (111)

(2020) Tse-An Chen et al.   NATURE

Efficient Chemical Mechanical Polishing of AISI 52100 Bearing Steel with TiSol-NH4 Dispersion-Based Slurries

(2020) Hanqiang Wu et al.   TRIBOLOGY LETTERS

Grain structure control during metal 3D printing by high-intensity ultrasound

(2020) C. J. Todaro et al.   Nature Communications

Evaluation of tool wear, surface roughness/topography and chip morphology when machining of Ni-based alloy 625 under MQL, cryogenic cooling and CryoMQL

(2020) Çağrı Vakkas Yıldırım et al.   Journal of Materials Research and Technology-JMR&T

Crack initiation mechanisms during very high cycle fatigue of Ni-based single crystal superalloys at high temperature

(2020) A. Cervellon et al.   ACTA MATERIALIA

Study on chemical effects of H2O2 and glycine in the Copper CMP process using ReaxFF MD

(2020) Xiaoguang Guo et al.   APPLIED SURFACE SCIENCE

A review of composition evolution in Ni-based single crystal superalloys

(2020) Wanshun Xia et al.   JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

Effect of ZnTe transition layer to the performance of CdZnTe/GaN multilayer films for solar-blind photodetector applications

(2020) jiahao sun et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Triethanolamine-Mediated Covalent Adaptable Epoxy Network: Excellent Mechanical Properties, Fast Repairing, and Easy Recycling

(2020) Cheng Hao et al.   MACROMOLECULES

Synergistic effect of composite complex agent on BTA removal in post CMP cleaning of copper interconnection

(2020) Da Yin et al.   MATERIALS CHEMISTRY AND PHYSICS

Recent developments and applications of chemical mechanical polishing

(2020) Zhao-Wei Zhong   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Hydrogen evolution and quantum calculations for potassium sorbate as an efficient green inhibitor for biodegradable magnesium alloy staples used for sleeve gastrectomy surgery

(2020) Azza A. Ghoneim et al.   INTERNATIONAL JOURNAL OF HYDROGEN ENERGY

The Structural Basis of the Binding of Various Aminopolycarboxylates by the Periplasmic EDTA-Binding Protein EppA from Chelativorans sp. BNC1

(2020) Kevin M. Lewis et al.   INTERNATIONAL JOURNAL OF MOLECULAR SCIENCES

Highly Selective Polishing Rate Between a Tungsten Film and a Silicon-Dioxide Film by Using a Malic-Acid Selectivity Agent in Tungsten-Film Chemical-Mechanical Planarization

(2020) Eun-Bin Seo et al.   JOURNAL OF THE KOREAN PHYSICAL SOCIETY

The Cycle Characteristics of Slurries in Chemical Mechanical Polishing (CMP) of Fused Silica

(2020) Chengxi Kang et al.   ChemistrySelect

Influence of surface pre-treatment with mechanical polishing, chemical, electrochemical and ion sputter etching on the surface properties, corrosion resistance and MG-63 cell colonization of commercially pure titanium

(2020) Petr Vlcak et al.   Materials Science & Engineering C-Materials for Biological Applications

Tungsten passivation layer (WO3) formation mechanisms during chemical mechanical planarization in the presence of oxidizers

(2020) Maneesh Kumar Poddar et al.   APPLIED SURFACE SCIENCE

Studies on the electro-mechanical polishing effects of titanium alloy with ion-exchange resin solid particles

(2020) Yihang Cheng et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Novel polyelectrolyte–Al2O3/SiO2 composite nanoabrasives for improved chemical mechanical polishing (CMP) of sapphire

(2019) Tianxian Wang et al.   JOURNAL OF MATERIALS RESEARCH

Graphene-assisted quasi-van der Waals epitaxy of AlN film for ultraviolet light emitting diodes on nano-patterned sapphire substrate

(2019) Hongliang Chang et al.   APPLIED PHYSICS LETTERS

Preparation of flower-shaped silica abrasives by double system template method and its effect on polishing performance of sapphire wafers

(2019) Lei Xu et al.   CERAMICS INTERNATIONAL

Cure Kinetics and Properties of High Performance Cycloaliphatic Epoxy Resins Cured with Anhydride

(2019) Maoping Lu et al.   INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Ecological trends in machining as a key factor in sustainable production – A review

(2019) G.M. Krolczyk et al.   JOURNAL OF CLEANER PRODUCTION

High total dissolved solids in shale gas wastewater inhibit biodegradation of alkyl and nonylphenol ethoxylate surfactants

(2019) Andrea J. Hanson et al.   SCIENCE OF THE TOTAL ENVIRONMENT

Preparation, characterization and thermal degradation behavior of rigid polyurethane foam using a malic acid based polyols

(2019) Rong Yang et al.   INDUSTRIAL CROPS AND PRODUCTS

Deformation behavior and microstructure evolution of titanium alloys with lamellar microstructure in hot working process: A review

(2019) Pengfei Gao et al.   JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

Effects of process parameters on chemical-mechanical interactions during sapphire polishing

(2019) Wenhu Xu et al.   MICROELECTRONIC ENGINEERING

The effect of citric acid based cleaning solution on particle adhesion and removal during post-Cu CMP cleaning

(2019) Lifei Zhang et al.   MICROELECTRONIC ENGINEERING

Investigation of particle agglomeration with in-situ generation of oxygen bubble during the tungsten chemical mechanical polishing (CMP) process

(2019) Yeon-Ah Jeong et al.   MICROELECTRONIC ENGINEERING

Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy

(2019) Zhenyu Zhang et al.   APPLIED SURFACE SCIENCE

Microstructural evolution and creep mechanisms in Ni-based single crystal superalloys: A review

(2019) Wanshun Xia et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Preparation of SiC/SiO2 Hard Core–Soft Shell Abrasive and Its CMP Behavior on Sapphire Substrate

(2019) Sanwei Dai et al.   JOURNAL OF ELECTRONIC MATERIALS

Atomistic Insights into Cu Chemical Mechanical Polishing Mechanism in Aqueous Hydrogen Peroxide and Glycine: ReaxFF Reactive Molecular Dynamics Simulations

(2019) Jialin Wen et al.   Journal of Physical Chemistry C

Polarized monolithic white semipolar (20–21) InGaN light-emitting diodes grown on high quality (20–21) GaN/sapphire templates and its application to visible light communication

(2019) Michel Khoury et al.   Nano Energy

Design of composite abrasives and substrate materials for chemical mechanical polishing applications

(2019) Fanning Meng et al.   Applied Nanoscience

Surface Modification of Titanium and Titanium Alloys: Technologies, Developments, and Future Interests

(2019) Lai-Chang Zhang et al.   ADVANCED ENGINEERING MATERIALS

Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism

(2019) Xiao-Lei Shi et al.   APPLIED SURFACE SCIENCE

Effect of arginine-based cleaning solution on BTA residue removal after Cu-CMP

(2019) Qi Wang et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Roles and mechanism analysis of chitosan as a green additive in low-tech node copper film chemical mechanical polishing

(2019) Jiakai Zhou et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Nanocatalyst-induced hydroxyl radical (·OH) slurry for tungsten CMP for next-generation semiconductor processing

(2019) Maneesh Kumar Poddar et al.   JOURNAL OF MATERIALS SCIENCE

Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries

(2019) Lianjun Hu et al.   MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Boosted ultraviolet electroluminescence of InGaN/AlGaN quantum structures grown on high-index contrast patterned sapphire with silica array

(2019) Hongpo Hu et al.   Nano Energy

AlGaN-based deep UV LEDs grown on sputtered and high temperature annealed AlN/sapphire

(2018) Norman Susilo et al.   APPLIED PHYSICS LETTERS

A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry

(2018) Zhenyu Zhang et al.   APPLIED SURFACE SCIENCE

Inhibition effect of glycine on molybdenum corrosion during CMP in alkaline H 2 O 2 based abrasive free slurry

(2018) Guang Yang et al.   APPLIED SURFACE SCIENCE

Determining the sub-surface damage of CdTe single crystals after lapping

(2018) O. Šik et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

The influence of chemical polishing of titanium scaffolds on their mechanical strength and in-vitro cell response

(2018) Bartłomiej Wysocki et al.   Materials Science & Engineering C-Materials for Biological Applications

Degradation of inhibitor in alkaline cleaning solution for post-Cu CMP cleaning

(2018) Shin-Mei Lai et al.   SURFACE & COATINGS TECHNOLOGY

Atomically thin noble metal dichalcogenide: a broadband mid-infrared semiconductor

(2018) Xuechao Yu et al.   Nature Communications

Atomistic mechanisms of Cu CMP in aqueous H2O2: Molecular dynamics simulations using ReaxFF reactive force field

(2018) Xiaoguang Guo et al.   COMPUTATIONAL MATERIALS SCIENCE

Perspective: Ga2O3 for ultra-high power rectifiers and MOSFETS

(2018) S. J. Pearton et al.   JOURNAL OF APPLIED PHYSICS

Cadmium zinc telluride pixel detectors for high-intensity x-ray imaging at free electron lasers

(2018) M C Veale et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Three-dimensional femtosecond laser nanolithography of crystals

(2018) Airán Ródenas et al.   Nature Photonics

The influence of surface processing on properties of CdZnTe films prepared by close-spaced sublimation

(2018) Fan Yang et al.   SURFACE & COATINGS TECHNOLOGY

Preparation of ellipsoidal rod-shaped silica nanocomposite abrasives by Chromium ion/PEG200 induced method for sapphire substrates chemical mechanical polishing

(2018) Yue Dong et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Environment friendly chemical mechanical polishing of copper

(2018) Zhenyu Zhang et al.   APPLIED SURFACE SCIENCE

Highly efficient removal of sapphire by composite nanoabrasive with novel inorganic polyelectrolyte as a binder

(2018) Tianxian Wang et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Directional Growth of Ultralong CsPbBr3 Perovskite Nanowires for High-Performance Photodetectors

(2017) Muhammad Shoaib et al.   JOURNAL OF THE AMERICAN CHEMICAL SOCIETY

Influence of slurry components on copper CMP performance in alkaline slurry

(2017) Qinzhi Xu et al.   MICROELECTRONIC ENGINEERING

Streaking of 43-attosecond soft-X-ray pulses generated by a passively CEP-stable mid-infrared driver

(2017) Thomas Gaumnitz et al.   OPTICS EXPRESS

42  PW, 20  fs Ti:sapphire laser at 01  Hz

(2017) Jae Hee Sung et al.   OPTICS LETTERS

Citric Acid as a Complexing Agent in Chemical Mechanical Polishing Slurries for Cobalt Films for Interconnect Applications

(2017) R. Popuri et al.   ECS Journal of Solid State Science and Technology

Effect of a pH Regulator on Sapphire Substrate CMP

(2017) Jianchao Wang et al.   ECS Journal of Solid State Science and Technology

Study on Chemical Mechanical Polishing Performances of Sapphire Wafer (0001) Using Silica-Based Slurry

(2017) Zefang Zhang et al.   ECS Journal of Solid State Science and Technology

Optical and electrical study of CdZnTe surfaces passivated by KOH and NH 4 F solutions

(2016) J. Zázvorka et al.   APPLIED SURFACE SCIENCE

Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process

(2016) Byoung-Jun Cho et al.   APPLIED SURFACE SCIENCE

Effects of non-spherical colloidal silica slurry on Al-NiP hard disk substrate CMP application

(2016) Sideq Salleh et al.   APPLIED SURFACE SCIENCE

Effect of a novel chelating agent on defect removal during post-CMP cleaning

(2016) Jiao Hong et al.   APPLIED SURFACE SCIENCE

A nano-scale mirror-like surface of Ti–6Al–4V attained by chemical mechanical polishing

(2016) Chenliang Liang et al.   Chinese Physics B

Simultaneous Determination of Potassium Sorbate, Sodium Benzoate, Quinoline Yellow and Sunset Yellow in Lemonades and Lemon Sauces by HPLC Using Experimental Design

(2016) Şule Dinç Zor et al.   JOURNAL OF CHROMATOGRAPHIC SCIENCE

Long-Term Stable Surface Treatments on CdTe and CdZnTe Radiation Detectors

(2016) Jakub Pekarek et al.   JOURNAL OF ELECTRONIC MATERIALS

GaN-based light-emitting diodes on various substrates: a critical review

(2016) Guoqiang Li et al.   REPORTS ON PROGRESS IN PHYSICS

Metal additive manufacturing for microelectromechanical systems: Titanium alloy (Ti-6Al-4V)-based nanopositioning flexure fabricated by electron beam melting

(2016) Hasan S. Fiaz et al.   SENSORS AND ACTUATORS A-PHYSICAL

A novel approach of chemical mechanical polishing using environment-friendly slurry for mercury cadmium telluride semiconductors

(2016) Zhenyu Zhang et al.   Scientific Reports

A novel approach of chemical mechanical polishing for cadmium zinc telluride wafers

(2016) Zhenyu Zhang et al.   Scientific Reports

Chemical mechanical polishing of steel substrate using colloidal silica-based slurries

(2015) Liang Jiang et al.   APPLIED SURFACE SCIENCE

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

(2015) Li Xu et al.   APPLIED SURFACE SCIENCE

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

(2015) Yan Zhou et al.   TRIBOLOGY INTERNATIONAL

Chemical Mechanical Polishing of Stainless Steel as Solar Cell Substrate

(2015) L. Jiang et al.   ECS Journal of Solid State Science and Technology

Benzotriazole as a passivating agent during chemical mechanical planarization of Ni–P alloy substrates

(2014) Yan Mu et al.   APPLIED SURFACE SCIENCE

Chemical mechanical polishing of steel substrate using aluminum nanoparticles abrasive slurry

(2014) De-Xing Peng   INDUSTRIAL LUBRICATION AND TRIBOLOGY

Solution of emulsifiable oil and hydrogen peroxide for chemical–mechanical polishing of Ti alloy—A green approach

(2014) Roopesh M. Kaushik et al.   MATERIALS LETTERS

Synergetic effect of benzotriazole and non-ionic surfactant on copper chemical mechanical polishing in KIO4-based slurries

(2014) Liang Jiang et al.   THIN SOLID FILMS

Synthesis and Characterization of SiO2Nanoparticles and Their Efficacy in Chemical Mechanical Polishing Steel Substrate

(2014) M. J. Kao et al.   Advances in Materials Science and Engineering

“Green” electronics: biodegradable and biocompatible materials and devices for sustainable future

(2013) Mihai Irimia-Vladu   CHEMICAL SOCIETY REVIEWS

Role of hydrogen bonding on the adsorption of several amino acids on SiO2 and Si3N4 and selective polishing of these materials using ceria dispersions

(2013) Naresh K. Penta et al.   COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS

Novel Approach to Surface Processing for Improving the Efficiency of CdZnTe Detectors

(2013) A. Hossain et al.   JOURNAL OF ELECTRONIC MATERIALS

A multi-technique characterization of electroless gold contacts on single crystal CdZnTe radiation detectors

(2013) S J Bell et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Chemical mechanical polishing: Theory and experiment

(2013) Dewen Zhao et al.   Friction

Synthesis of High Quality Monolayer Graphene at Reduced Temperature on Hydrogen-Enriched Evaporated Copper (111) Films

(2012) Li Tao et al.   ACS Nano

Chemical mechanical polishing of stainless steel foil as flexible substrate

(2012) Xiaokai Hu et al.   APPLIED SURFACE SCIENCE

An XPS study of bromine in methanol etching and hydrogen peroxide passivation treatments for cadmium zinc telluride radiation detectors

(2012) S. Babar et al.   APPLIED SURFACE SCIENCE

Cobalt Polishing with Reduced Galvanic Corrosion at Copper/Cobalt Interface Using Hydrogen Peroxide as an Oxidizer in Colloidal Silica-Based Slurries

(2012) B. C. Peethala et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Characterization of Nanoscale Chips and a Novel Model for Face Nanogrinding on Soft-Brittle HgCdTe Films

(2012) Zhenyu Zhang et al.   TRIBOLOGY LETTERS

A wafer-scale material removal rate profile model for copper chemical mechanical planarization

(2011) Hyunseop Lee et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

Potassium sorbate as an inhibitor in copper chemical mechanical planarization slurries. Part II: Effects of sorbate on chemical mechanical planarization performance

(2010) Magi Nagar et al.   ELECTROCHIMICA ACTA

Potassium sorbate as an inhibitor in copper chemical mechanical planarization slurry. Part I. Elucidating slurry chemistry

(2010) Magi Nagar et al.   ELECTROCHIMICA ACTA

Study of effects of polishing and etching processes on Cd1−xZnxTe surface quality

(2010) A. Bensouici et al.   JOURNAL OF CRYSTAL GROWTH

Electrochemical characterization of copper chemical mechanical polishing in l-glutamic acid–hydrogen peroxide-based slurries

(2010) Noyel Victoria Selvam et al.   JOURNAL OF SOLID STATE ELECTROCHEMISTRY

Novel automatic electrochemical–mechanical polishing (ECMP) of metals for scanning electron microscopy

(2010) J. Tiley et al.   MICRON

The Core Structure of Basal Dislocations in Deformed Sapphire ( -Al2O3)

(2010) A. H. Heuer et al.   SCIENCE

Atomic Structure and Electrical Properties of In(Te) Nanocontacts on CdZnTe(110) by Scanning Probe Microscopy

(2009) Gili Cohen-Taguri et al.   ADVANCED FUNCTIONAL MATERIALS

Nanoscale machinability and subsurface damage machined by CMP of soft-brittle CdZnTe crystals

(2009) Zhenyu Zhang et al.   INTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGY

Magnetic properties evaluation of ageing behaviour in water-quenched 5Cr–0.5Mo steel

(2009) J N Mohapatra et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Macroscopic 10-Terabit-per-Square-Inch Arrays from Block Copolymers with Lateral Order

(2009) S. Park et al.   SCIENCE

Ultra-precision polishing of electroless nickel molding dies for shorter wavelength applications

(2008) Y. Namba et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

Effects of mosaic structure on the physical properties of CdZnTe crystals

(2008) Dongmei Zeng et al.   NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT

Chemical mechanical polishing and nanomechanics of semiconductor CdZnTe single crystals

(2008) Zhenyu Zhang et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Relative roles of acetic acid, dodecyl sulfate and benzotriazole in chemical mechanical and electrochemical mechanical planarization of copper

(2007) P.C. Goonetilleke et al.   APPLIED SURFACE SCIENCE