Chemical mechanical polishing for sapphire wafers using a developed slurry

Effects of polishing parameters on surface quality in sapphire double-sided CMP

(2020) Zhongyang Li et al.   CERAMICS INTERNATIONAL

Novel polyelectrolyte–Al2O3/SiO2 composite nanoabrasives for improved chemical mechanical polishing (CMP) of sapphire

(2019) Tianxian Wang et al.   JOURNAL OF MATERIALS RESEARCH

Preparation of Irregular Silica Nanoparticles by the Polymer Templating for Chemical Mechanical Polishing of Sapphire Substrates

(2019) Yue Dong et al.   JOURNAL OF ELECTRONIC MATERIALS

Synthesis and characterization of ZrO2@SiO2 core-shell nanostructure as nanocatalyst: Application for environmental remediation of rhodamine B dye aqueous solution

(2019) D.S.S. Padovini et al.   MATERIALS CHEMISTRY AND PHYSICS

Evolution of mechanically formed bow due to surface waviness and residual stress difference on sapphire (0001) substrate

(2019) In-Young Jung et al.   JOURNAL OF MATERIALS PROCESSING TECHNOLOGY

Development of binder-free CMG abrasive pellet and finishing performance on mono-crystal sapphire

(2019) Jianbin Wang et al.   PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

Preparation of MgO doped colloidal SiO 2 abrasive and their chemical mechanical polishing performance on c-, r- and a-plane sapphire substrate

(2018) Da Yin et al.   CERAMICS INTERNATIONAL

Study on high efficient sapphire wafer processing by coupling SG-mechanical polishing and GLA-CMP

(2018) Yongchao Xu et al.   INTERNATIONAL JOURNAL OF MACHINE TOOLS & MANUFACTURE

A new process design for manufacturing sapphire wafers

(2018) Eckart Uhlmann et al.   PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

Preparation of a novel catalyst (SoFe III ) and its catalytic performance towards the removal rate of sapphire substrate during CMP process

(2018) Li Xu et al.   TRIBOLOGY INTERNATIONAL

Research on R-Plane Sapphire Substrate CMP Removal Rate Based on a New-Type Alkaline Slurry

(2018) Xin Zhao et al.   ECS Journal of Solid State Science and Technology

Highly efficient removal of sapphire by composite nanoabrasive with novel inorganic polyelectrolyte as a binder

(2018) Tianxian Wang et al.   JOURNAL OF ALLOYS AND COMPOUNDS

Role of a New Type Chelating Agent in Chemical Mechanical Polishing of R-Plane Sapphire Substrate

(2017) Xin Zhao et al.   ECS Journal of Solid State Science and Technology

Study on Chemical Mechanical Polishing Performances of Sapphire Wafer (0001) Using Silica-Based Slurry

(2017) Zefang Zhang et al.   ECS Journal of Solid State Science and Technology

Study on planarization machining of sapphire wafer with soft-hard mixed abrasive through mechanical chemical polishing

(2016) Yongchao Xu et al.   APPLIED SURFACE SCIENCE

Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire

(2015) Li Xu et al.   APPLIED SURFACE SCIENCE

Atmospheric pressure plasma enabled polishing of single crystal sapphire

(2015) Ashraf F. Bastawros et al.   CIRP ANNALS-MANUFACTURING TECHNOLOGY

AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)

(2015) Yan Zhou et al.   JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

Triethanolamine functionalized graphene-based composites for high performance supercapacitors

(2015) Bo Song et al.   Journal of Materials Chemistry A

New oxidation catalysts based on iron(III) porphyrins immobilized on Mg–Al layered double hydroxides modified with triethanolamine

(2010) Kelly Aparecida Dias de Freitas Castro et al.   APPLIED CATALYSIS A-GENERAL

The Core Structure of Basal Dislocations in Deformed Sapphire ( -Al2O3)

(2010) A. H. Heuer et al.   SCIENCE