Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics

First Demonstration of Laser-Assisted Charge Exchange for Microsecond Duration H− Beams

(2017) Sarah Cousineau et al.   PHYSICAL REVIEW LETTERS

Negative ion source development for a photoneutralization based neutral beam system for future fusion reactors

(2016) A Simonin et al.   NEW JOURNAL OF PHYSICS

A hybrid model of radio frequency biased inductively coupled plasma discharges: description of model and experimental validation in argon

(2016) De-Qi Wen et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Colloquium: Nanoplasmas generated by intense radiation

(2016) Kostya (Ken) Ostrikov et al.   REVIEWS OF MODERN PHYSICS

Controllable Synthesis of Graphene by Plasma-Enhanced Chemical Vapor Deposition and Its Related Applications

(2016) Menglin Li et al.   Advanced Science

High aspect ratio iridescent three-dimensional metal–insulator–metal capacitors using atomic layer deposition

(2015) Micheal Burke et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Study on contact distortion during high aspect ratio contact SiO2 etching

(2015) Jong Kyu Kim et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Overview of atomic layer etching in the semiconductor industry

(2015) Keren J. Kanarik et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Equivalent circuit effects on mode transitions in H2 inductively coupled plasmas

(2015) Hui-Jing Xu et al.   PHYSICS OF PLASMAS

Helicon discharges and sources: a review

(2015) Francis F Chen   PLASMA SOURCES SCIENCE & TECHNOLOGY

Electron dynamics and frequency coupling in a radio-frequency capacitively biased planar coil inductively coupled plasma system

(2015) M Zaka-ul-Islam et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Bistable solutions for the electron energy distribution function in electron swarms in xenon: a comparison between the results of first-principles particle simulations and conventional Boltzmann equation analysis

(2015) Nikolay Dyatko et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Electron heating and control of electron energy distribution for the enhancement of the plasma ashing processing

(2015) Hyo-Chang Lee et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment and Modeling

(2015) Hyo-Chang Lee et al.   Scientific Reports

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies

(2014) R Dussart et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

The grand challenges of plasma etching: a manufacturing perspective

(2014) Chris G N Lee et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Guided ionization waves: Theory and experiments

(2014) X. Lu et al.   PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS

Plasmas for environmental issues: from hydrogen production to 2D materials assembly

(2014) E Tatarova et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Control of electron energy distribution by adding a pulse inductive field in capacitive discharge

(2014) Hyo-Chang Lee et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Critical Crystal Growth of Graphene on Dielectric Substrates at Low Temperature for Electronic Devices

(2013) Dacheng Wei et al.   ANGEWANDTE CHEMIE-INTERNATIONAL EDITION

Discharge mode transition and hysteresis in inductively coupled plasma

(2013) Hyo-Chang Lee et al.   APPLIED PHYSICS LETTERS

Review on electrical discharge plasma technology for wastewater remediation

(2013) Bo Jiang et al.   CHEMICAL ENGINEERING JOURNAL

Ferromagnetic enhanced inductive plasma sources

(2013) Valery Godyak   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Plasma etching: Yesterday, today, and tomorrow

(2013) Vincent M. Donnelly et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

(2013) Dominik Metzler et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Extreme-ultraviolet light generation in plasmonic nanostructures

(2013) M. Sivis et al.   Nature Physics

Generation and Bistability of a Waveguide Nanoplasma Observed by Enhanced Extreme-Ultraviolet Fluorescence

(2013) Murat Sivis et al.   PHYSICAL REVIEW LETTERS

Effect of antenna size on electron kinetics in inductively coupled plasmas

(2013) Hyo-Chang Lee et al.   PHYSICS OF PLASMAS

Hydrogen-free PECVD growth of few-layer graphene on an ultra-thin nickel film at the threshold dissolution temperature

(2013) Kaung-Jay Peng et al.   Journal of Materials Chemistry C

Direct Growth of Doping-Density-Controlled Hexagonal Graphene on SiO2 Substrate by Rapid-Heating Plasma CVD

(2012) Toshiaki Kato et al.   ACS Nano

Si-Compatible Cleaning Process for Graphene Using Low-Density Inductively Coupled Plasma

(2012) Yeong-Dae Lim et al.   ACS Nano

High-Pressure Gas Phase Femtosecond Laser Ionization Mass Spectrometry

(2012) Jiahui Peng et al.   ANALYTICAL CHEMISTRY

Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge

(2012) Hyo-Chang Lee et al.   APPLIED PHYSICS LETTERS

Coupling effects in inductive discharges with radio frequency substrate biasing

(2012) J. Schulze et al.   APPLIED PHYSICS LETTERS

Application of glow discharge plasma for wastewater treatment

(2012) Xiaoyan Wang et al.   ELECTROCHIMICA ACTA

Effect of capacitive coupling in a miniature inductively coupled plasma source

(2012) Yoshinori Takao et al.   JOURNAL OF APPLIED PHYSICS

Inductively coupled plasma torch efficiency at atmospheric pressure for organo-chlorine liquid waste removal: Chloroform destruction in oxidative conditions

(2012) Georges Kamgang-Youbi et al.   JOURNAL OF HAZARDOUS MATERIALS

Future Prospects of NAND Flash Memory Technology—The Evolution from Floating Gate to Charge Trapping to 3D Stacking

(2012) Chih-Yuan Lu   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Methane as an effective hydrogen source for single-layer graphene synthesis on Cu foil by plasma enhanced chemical vapor deposition

(2012) Yong Seung Kim et al.   Nanoscale

Nanostructure-enhanced atomic line emission

(2012) M. Sivis et al.   NATURE

Two centuries of memristors

(2012) Themistoklis Prodromakis et al.   NATURE MATERIALS

Memristive devices for computing

(2012) J. Joshua Yang et al.   Nature Nanotechnology

Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic regimes

(2012) Hyo-Chang Lee et al.   PHYSICS OF PLASMAS

Performance of a permanent-magnet helicon source at 27 and 13 MHz

(2012) Francis F. Chen   PHYSICS OF PLASMAS

Experimental observation of the skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias

(2012) Hyo-Chang Lee et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

The development of the radio frequency driven negative ion source for neutral beam injectors (invited)

(2012) W. Kraus et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Direct PECVD growth of vertically erected graphene walls on dielectric substrates as excellent multifunctional electrodes

(2012) Chongyin Yang et al.   Journal of Materials Chemistry A

Carbon nanowalls deposited by inductively coupled plasma enhanced chemical vapor deposition using aluminum acetylacetonate as precursor

(2011) Himani Gaur Jain et al.   CARBON

Growth of graphene on Cu by plasma enhanced chemical vapor deposition

(2011) Tomo-o Terasawa et al.   CARBON

E–H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas

(2011) Jung-Kyu Lee et al.   CURRENT APPLIED PHYSICS

Transition from E to H mode in inductively coupled oxygen plasma: Hysteresis and the behaviour of oxygen atom density

(2011) R. Zaplotnik et al.   EPL

Evolution of Two-Dimensional Plasma Density on the E–H Heating-Mode Transition in Planar-Type Inductively Coupled Plasma

(2011) Hyo-Chang Lee et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

A self-consistent global model of solenoidal-type inductively coupled plasma discharges including the effects of radio-frequency bias power

(2011) D. C. Kwon et al.   JOURNAL OF APPLIED PHYSICS

Perspectives in nanoscale plasma etching: what are the ultimate limits?

(2011) Nathan Marchack et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Actions of low- and high-energy electrons on the phase transition between E- and H-modes in an inductively coupled plasma in Ar

(2011) Yuichiro Hayashi et al.   NEW JOURNAL OF PHYSICS

Specific features of the current-voltage characteristics of diffuse glow discharges in Ar:N2 mixtures

(2011) N. A. Dyatko et al.   PLASMA PHYSICS REPORTS

Electrical and plasma parameters of ICP with high coupling efficiency

(2011) V A Godyak   PLASMA SOURCES SCIENCE & TECHNOLOGY

Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma

(2011) Hyo-Chang Lee et al.   THIN SOLID FILMS

Highly Efficient Silicon Nanoarray Solar Cells by a Single-Step Plasma-Based Process

(2011) S. Xu et al.   Advanced Energy Materials

Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma

(2010) Hyo-Chang Lee et al.   APPLIED PHYSICS LETTERS

Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas

(2010) Hyo-Chang Lee et al.   APPLIED PHYSICS LETTERS

High aspect ratio silicon etch: A review

(2010) Banqiu Wu et al.   JOURNAL OF APPLIED PHYSICS

Synthesis of graphene on a polycrystalline Co film by radio-frequency plasma-enhanced chemical vapour deposition

(2010) S M Wang et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Catalyst-free growth of nanographene films on various substrates

(2010) Lianchang Zhang et al.   Nano Research

Effects of matching network on the hysteresis during E and H mode transitions in argon inductively coupled plasma

(2010) Fei Gao et al.   PHYSICS OF PLASMAS

Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma

(2010) Hyo-Chang Lee et al.   PHYSICS OF PLASMAS

Large-area high-density helicon plasma sources

(2010) S Shinohara et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Spatiotemporal optical structure of plasmas in the E-to-H mode transition in an inductively coupled plasma in Ar

(2010) Satoshi Morishita et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Minihelicon Plasma Thruster

(2009) O.V. Batishchev   IEEE TRANSACTIONS ON PLASMA SCIENCE

Dynamic investigation of mode transition in inductively coupled plasma with a hybrid model

(2009) Shu-Xia Zhao et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Hysteresis induced by gap length effects in capacitively coupled plasmas at low pressures

(2009) Wei Jiang et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Collisionless heating in radio-frequency discharges: a review

(2009) M M Turner   JOURNAL OF PHYSICS D-APPLIED PHYSICS

The HelCat dual-source plasma device

(2009) Alan G. Lynn et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Plasma power measurement and hysteresis in the E–H transition of a rf inductively coupled plasma system

(2008) A. M. Daltrini et al.   APPLIED PHYSICS LETTERS

Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

(2008) Haruhiko Abe et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

The fabrication of patternable silicon nanotips using deep reactive ion etching

(2008) Chang Kun Kang et al.   JOURNAL OF MICROMECHANICS AND MICROENGINEERING

Bias power dependence of reactive ion etching lag in contact hole etching using inductively coupled fluorocarbon plasma

(2008) Shin-ichi Imai   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Wafer-scale patterning of sub-40 nm diameter and high aspect ratio (>50:1) silicon pillar arrays by nanoimprint and etching

(2008) Keith J Morton et al.   NANOTECHNOLOGY

The missing memristor found

(2008) Dmitri B. Strukov et al.   NATURE

Effects of impedance matching network on the discharge mode transitions in a radio-frequency inductively coupled plasma

(2008) Z. F. Ding et al.   PHYSICS OF PLASMAS

Electron/ion energy loss to discharge walls revised: A case study in low-temperature, thermally nonequilibrium plasmas

(2008) Y. P. Ren et al.   PHYSICS OF PLASMAS

Analytic theory of L→H transition, barrier structure, and hysteresis for a simple model of coupled particle and heat fluxes

(2008) M. A. Malkov et al.   PHYSICS OF PLASMAS

Electron scattering from argon: Data evaluation and consistency

(2008) E. Gargioni et al.   REVIEWS OF MODERN PHYSICS