Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films

Title
Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films
Authors
Keywords
Ferroelectric, Hafnia, Impurity, Atomic layer deposition, Switching kinetics
Journal
ACTA MATERIALIA
Volume 222, Issue -, Pages 117405
Publisher
Elsevier BV
Online
2021-10-28
DOI
10.1016/j.actamat.2021.117405

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