Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films
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Title
Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films
Authors
Keywords
Ferroelectric, Hafnia, Impurity, Atomic layer deposition, Switching kinetics
Journal
ACTA MATERIALIA
Volume 222, Issue -, Pages 117405
Publisher
Elsevier BV
Online
2021-10-28
DOI
10.1016/j.actamat.2021.117405
References
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Note: Only part of the references are listed.- Enhanced ferroelectricity in ultrathin films grown directly on silicon
- (2020) Suraj S. Cheema et al. NATURE
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- (2020) Hyun-Jae Lee et al. SCIENCE
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- (2019) Y. Zhou et al. COMPUTATIONAL MATERIALS SCIENCE
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- (2019) Min Hyuk Park et al. REPORTS ON PROGRESS IN PHYSICS
- On the Origin of the Large Remanent Polarization in La:HfO 2
- (2019) Tony Schenk et al. Advanced Electronic Materials
- Stable Subloop Behavior in Ferroelectric Si-Doped HfO2
- (2019) Kyoungjun Lee et al. ACS Applied Materials & Interfaces
- Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material
- (2018) Uwe Schroeder et al. INORGANIC CHEMISTRY
- Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors
- (2018) Thomas Mikolajick et al. MRS BULLETIN
- Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO2
- (2018) Everett D. Grimley et al. Advanced Materials Interfaces
- Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction
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- Origin of Temperature-Dependent Ferroelectricity in Si-Doped HfO2
- (2018) Min Hyuk Park et al. Advanced Electronic Materials
- Dispersion in ferroelectric switching performance of polycrystalline Hf0.5Zr0.5O2 thin films
- (2018) Seung Dam Hyun et al. ACS Applied Materials & Interfaces
- Review and perspective on ferroelectric HfO2-based thin films for memory applications
- (2018) Min Hyuk Park et al. MRS Communications
- Morphotropic Phase Boundary of Hf1–xZrxO2 Thin Films for Dynamic Random Access Memories
- (2018) Min Hyuk Park et al. ACS Applied Materials & Interfaces
- Nucleation-Limited Ferroelectric Orthorhombic Phase Formation in Hf0.5 Zr0.5 O2 Thin Films
- (2018) Young Hwan Lee et al. Advanced Electronic Materials
- Factors Favoring Ferroelectricity in Hafnia: A First-Principles Computational Study
- (2017) Rohit Batra et al. Journal of Physical Chemistry C
- Surface and grain boundary energy as the key enabler of ferroelectricity in nanoscale hafnia-zirconia: a comparison of model and experiment
- (2017) Min Hyuk Park et al. Nanoscale
- A comprehensive study on the structural evolution of HfO2 thin films doped with various dopants
- (2017) M. H. Park et al. Journal of Materials Chemistry C
- Scale-up and optimization of HfO 2 -ZrO 2 solid solution thin films for the electrostatic supercapacitors
- (2017) Keum Do Kim et al. Nano Energy
- Understanding the formation of the metastable ferroelectric phase in hafnia–zirconia solid solution thin films
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- Effect of Zr Content on the Wake-Up Effect in Hf1–xZrxO2 Films
- (2016) Min Hyuk Park et al. ACS Applied Materials & Interfaces
- Direct Observation of Negative Capacitance in Polycrystalline Ferroelectric HfO2
- (2016) Michael Hoffmann et al. ADVANCED FUNCTIONAL MATERIALS
- Physical Mechanisms behind the Field-Cycling Behavior of HfO2 -Based Ferroelectric Capacitors
- (2016) Milan Pešić et al. ADVANCED FUNCTIONAL MATERIALS
- Ferroelectric phase stabilization of HfO2by nitrogen doping
- (2016) Lun Xu et al. Applied Physics Express
- Stabilization of metastable phases in hafnia owing to surface energy effects
- (2016) Rohit Batra et al. APPLIED PHYSICS LETTERS
- Two-step polarization switching mediated by a nonpolar intermediate phase in Hf0.4Zr0.6O2thin films
- (2016) Min Hyuk Park et al. Nanoscale
- A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2films by pulse-switching measurement
- (2016) Han Joon Kim et al. Nanoscale
- Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition
- (2016) K. D. Kim et al. Journal of Materials Chemistry C
- Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
- (2015) Min Hyuk Park et al. ADVANCED MATERIALS
- On the structural origins of ferroelectricity in HfO2 thin films
- (2015) Xiahan Sang et al. APPLIED PHYSICS LETTERS
- The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model
- (2015) R. Materlik et al. JOURNAL OF APPLIED PHYSICS
- Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf0.5Zr0.5O2 thin films
- (2015) M. H. Park et al. Journal of Materials Chemistry C
- Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric Hf x Zr 1−x O 2 films
- (2015) Min Hyuk Park et al. Nano Energy
- Antiferroelectricity in thin-filmZrO2from first principles
- (2014) Sebastian E. Reyes-Lillo et al. PHYSICAL REVIEW B
- Pathways towards ferroelectricity in hafnia
- (2014) Tran Doan Huan et al. PHYSICAL REVIEW B
- Thin HfxZr1-xO2Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability
- (2014) Min Hyuk Park et al. Advanced Energy Materials
- Evolutionary search for new high-kdielectric materials: methodology and applications to hafnia-based oxides
- (2014) Qingfeng Zeng et al. Acta Crystallographica Section C-Structural Chemistry
- Strain controlled ferroelectric switching time of BiFeO3 capacitors
- (2012) E. J. Guo et al. APPLIED PHYSICS LETTERS
- Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition
- (2012) Deok-Yong Cho et al. CHEMISTRY OF MATERIALS
- Ferroelectricity in Simple Binary ZrO2 and HfO2
- (2012) Johannes Müller et al. NANO LETTERS
- Ferroelectricity in hafnium oxide thin films
- (2011) T. S. Böscke et al. APPLIED PHYSICS LETTERS
- Gwyddion: an open-source software for SPM data analysis
- (2011) David Nečas et al. Open Physics
- Atomic Layer Deposition of Gd-Doped HfO[sub 2] Thin Films
- (2010) C. Adelmann et al. JOURNAL OF THE ELECTROCHEMICAL SOCIETY
- Nonlinear Dynamics of Domain-Wall Propagation in Epitaxial Ferroelectric Thin Films
- (2009) J. Y. Jo et al. PHYSICAL REVIEW LETTERS
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