Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition

Published 2012 View Full Article

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Title
Stabilization of Tetragonal HfO2 under Low Active Oxygen Source Environment in Atomic Layer Deposition
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 24, Issue 18, Pages 3534-3543
Publisher
American Chemical Society (ACS)
Online
2012-08-28
DOI
10.1021/cm3001199

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