Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf0.5Zr0.5O2 thin films
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Title
Study on the internal field and conduction mechanism of atomic layer deposited ferroelectric Hf0.5Zr0.5O2 thin films
Authors
Keywords
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Journal
Journal of Materials Chemistry C
Volume 3, Issue 24, Pages 6291-6300
Publisher
Royal Society of Chemistry (RSC)
Online
2015-05-21
DOI
10.1039/c5tc01074h
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