Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films
出版年份 2021 全文链接
标题
Effect of residual impurities on polarization switching kinetics in atomic-layer-deposited ferroelectric Hf0.5Zr0.5O2 thin films
作者
关键词
Ferroelectric, Hafnia, Impurity, Atomic layer deposition, Switching kinetics
出版物
ACTA MATERIALIA
Volume 222, Issue -, Pages 117405
出版商
Elsevier BV
发表日期
2021-10-28
DOI
10.1016/j.actamat.2021.117405
参考文献
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