Stable Subloop Behavior in Ferroelectric Si-Doped HfO2

Published 2019 View Full Article

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Title
Stable Subloop Behavior in Ferroelectric Si-Doped HfO2
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 11, Issue 42, Pages 38929-38936
Publisher
American Chemical Society (ACS)
Online
2019-10-02
DOI
10.1021/acsami.9b12878

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