Effect of Annealing Ferroelectric HfO2 Thin Films: In Situ, High Temperature X-Ray Diffraction
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Title
Effect of Annealing Ferroelectric HfO2
Thin Films: In Situ, High Temperature X-Ray Diffraction
Authors
Keywords
-
Journal
Advanced Electronic Materials
Volume 4, Issue 7, Pages 1800091
Publisher
Wiley
Online
2018-05-17
DOI
10.1002/aelm.201800091
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