Effects of the dynamic cathode sheath on electron transport at the initial period of HiPIMS pulse studied by Langmuir probe measurements and 2D PIC-MCC simulation

Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

(2019) Rommel Paulo B. Viloan et al.   THIN SOLID FILMS

Cu films prepared by bipolar pulsed high power impulse magnetron sputtering

(2018) Baohua Wu et al.   VACUUM

2D PIC-MCC simulations of magnetron plasma in HiPIMS regime with external circuit

(2018) Adrien Revel et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Bipolar HiPIMS for tailoring ion energies in thin film deposition

(2018) Julien Keraudy et al.   SURFACE & COATINGS TECHNOLOGY

Pseudo-3D PIC modeling of drift-induced spatial inhomogeneities in planar magnetron plasmas

(2016) A. Revel et al.   PHYSICS OF PLASMAS

Simultaneous characterization of static and induced magnetic fields in high power impulse magnetron sputtering discharges

(2014) P D Machura et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Electron transport in magnetrons bya posterioriMonte Carlo simulations

(2014) C Costin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon

(2014) J. Luo et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

Space charge, plasma potential and electric field distributions in HiPIMS discharges of varying configuration

(2013) B Liebig et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Kinetics of plasma species and their ionization in short-HiPIMS by particle modeling

(2013) T.M. Minea et al.   SURFACE & COATINGS TECHNOLOGY

Plasma potential mapping of high power impulse magnetron sputtering discharges

(2012) Albert Rauch et al.   JOURNAL OF APPLIED PHYSICS

Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering

(2012) André Anders et al.   JOURNAL OF APPLIED PHYSICS

High power impulse magnetron sputtering discharge

(2012) J. T. Gudmundsson et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses

(2012) Chunqing Huo et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

An ionization region model for high-power impulse magnetron sputtering discharges

(2011) M A Raadu et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Internal current measurements in high power impulse magnetron sputtering

(2011) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Plasma Parameters in a Pre-Ionized HiPIMS Discharge Operating at Low Pressure

(2010) Phitsanu Poolcharuansin et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate

(2010) Anurag Mishra et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Short- and long-term plasma phenomena in a HiPIMS discharge

(2010) P Poolcharuansin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Plasma sheath physics and dose uniformity in enhanced glow discharge plasma immersion ion implantation and deposition

(2009) Liuhe Li et al.   JOURNAL OF APPLIED PHYSICS

Faster-than-Bohm Cross-BElectron Transport in Strongly Pulsed Plasmas

(2009) N. Brenning et al.   PHYSICAL REVIEW LETTERS

Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges

(2009) A D Pajdarová et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Langmuir probes in RF plasma: surprising validity of OML theory

(2009) Francis F Chen   PLASMA SOURCES SCIENCE & TECHNOLOGY

Anomalous electron transport in high power impulse magnetron sputtering

(2008) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Cross-field ion transport during high power impulse magnetron sputtering

(2008) Daniel Lundin et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

A bulk plasma model for dc and HiPIMS magnetrons

(2008) N Brenning et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Digital smoothing of the Langmuir probe I-V characteristic

(2008) F. Magnus et al.   REVIEW OF SCIENTIFIC INSTRUMENTS