Bipolar HiPIMS for tailoring ion energies in thin film deposition

Published 2018 View Full Article

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Title
Bipolar HiPIMS for tailoring ion energies in thin film deposition
Authors
Keywords
HiPIMS, Sputtering, Plasma
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 359, Issue -, Pages 433-437
Publisher
Elsevier BV
Online
2018-12-27
DOI
10.1016/j.surfcoat.2018.12.090

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