Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias

Published 2019 View Full Article

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Title
Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
Authors
Keywords
High power impulse magnetron sputtering, Bipolar HiPIMS, Ion energy distribution function tuning, Titanium nitride
Journal
THIN SOLID FILMS
Volume -, Issue -, Pages -
Publisher
Elsevier BV
Online
2019-06-04
DOI
10.1016/j.tsf.2019.05.069

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