Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon

Published 2014 View Full Article

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Title
Improved ion implant fluence uniformity in hydrogen enhanced glow discharge plasma immersion ion implantation into silicon
Authors
Keywords
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Journal
REVIEW OF SCIENTIFIC INSTRUMENTS
Volume 85, Issue 6, Pages 063506
Publisher
AIP Publishing
Online
2014-06-23
DOI
10.1063/1.4875982
References
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