Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance

The Chemistry of Inorganic Precursors during the Chemical Deposition of Films on Solid Surfaces

(2018) Seán T. Barry et al.   ACCOUNTS OF CHEMICAL RESEARCH

Atomic Layer Deposition of Rhenium Disulfide

(2018) Jani Hämäläinen et al.   ADVANCED MATERIALS

Anodic TiO 2 nanotubes decorated by Pt nanoparticles using ALD: An efficient electrocatalyst for methanol oxidation

(2018) V.C. Anitha et al.   JOURNAL OF CATALYSIS

Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition

(2018) Haoran Wang et al.   Advanced Materials Interfaces

Atomic layer deposition for biosensing applications

(2018) Octavio Graniel et al.   BIOSENSORS & BIOELECTRONICS

Surface reaction kinetics in atomic layer deposition: An analytical model and experiments

(2018) Triratna Muneshwar et al.   JOURNAL OF APPLIED PHYSICS

Atomic Layer Deposition for Membranes: Basics, Challenges, and Opportunities

(2018) Matthieu Weber et al.   CHEMISTRY OF MATERIALS

Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

(2018) Jiazhen Sheng et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Recent progress of atomic layer deposition on polymeric materials

(2017) Hong Chen Guo et al.   Materials Science & Engineering C-Materials for Biological Applications

Recent development of two-dimensional transition metal dichalcogenides and their applications

(2017) Wonbong Choi et al.   Materials Today

Enhanced photoelectrochemical efficiency and stability using a conformal TiO2 film on a black silicon photoanode

(2017) Yanhao Yu et al.   Nature Energy

Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene

(2016) Adrianus I. Aria et al.   ACS Applied Materials & Interfaces

Time as the Fourth Dimension: Opening up New Possibilities in Chemical Vapor Deposition

(2016) Henrik Pedersen   CHEMISTRY OF MATERIALS

AxBAxB… pulsed atomic layer deposition: Numerical growth model and experiments

(2016) Triratna Muneshwar et al.   JOURNAL OF APPLIED PHYSICS

Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition

(2015) Simon D. Elliott et al.   ADVANCED MATERIALS

Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation

(2015) Neha Batra et al.   AIP Advances

A brief review of atomic layer deposition: from fundamentals to applications

(2014) Richard W. Johnson et al.   Materials Today

Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory

(2013) Curtisha D. Travis et al.   CHEMICAL VAPOR DEPOSITION

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

(2013) Ville Miikkulainen et al.   JOURNAL OF APPLIED PHYSICS

Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure

(2013) Curtisha D. Travis et al.   THEORETICAL CHEMISTRY ACCOUNTS

Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al2O3 Atomic Layer Deposition

(2012) Byoung H. Lee et al.   Journal of Physical Chemistry C

Coking- and Sintering-Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition

(2012) Junling Lu et al.   SCIENCE

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

(2011) H. B. Profijt et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers

(2009) Steven M. George et al.   ACCOUNTS OF CHEMICAL RESEARCH

Ultra-thin microporous–mesoporous metal oxide films prepared by molecular layer deposition (MLD)

(2009) Xinhua Liang et al.   CHEMICAL COMMUNICATIONS

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3

(2008) S. B. S. Heil et al.   JOURNAL OF APPLIED PHYSICS

Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

(2008) David N. Goldstein et al.   Journal of Physical Chemistry C