Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance
出版年份 2019 全文链接
标题
Multiple short pulse process for low-temperature atomic layer deposition and its transient steric hindrance
作者
关键词
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出版物
APPLIED PHYSICS LETTERS
Volume 114, Issue 20, Pages 201902
出版商
AIP Publishing
发表日期
2019-05-24
DOI
10.1063/1.5095515
参考文献
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- (2018) Seán T. Barry et al. ACCOUNTS OF CHEMICAL RESEARCH
- Atomic Layer Deposition of Rhenium Disulfide
- (2018) Jani Hämäläinen et al. ADVANCED MATERIALS
- Anodic TiO 2 nanotubes decorated by Pt nanoparticles using ALD: An efficient electrocatalyst for methanol oxidation
- (2018) V.C. Anitha et al. JOURNAL OF CATALYSIS
- Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition
- (2018) Haoran Wang et al. Advanced Materials Interfaces
- Atomic layer deposition for biosensing applications
- (2018) Octavio Graniel et al. BIOSENSORS & BIOELECTRONICS
- Surface reaction kinetics in atomic layer deposition: An analytical model and experiments
- (2018) Triratna Muneshwar et al. JOURNAL OF APPLIED PHYSICS
- Atomic Layer Deposition for Membranes: Basics, Challenges, and Opportunities
- (2018) Matthieu Weber et al. CHEMISTRY OF MATERIALS
- Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development
- (2018) Jiazhen Sheng et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Recent progress of atomic layer deposition on polymeric materials
- (2017) Hong Chen Guo et al. Materials Science & Engineering C-Materials for Biological Applications
- Recent development of two-dimensional transition metal dichalcogenides and their applications
- (2017) Wonbong Choi et al. Materials Today
- Enhanced photoelectrochemical efficiency and stability using a conformal TiO2 film on a black silicon photoanode
- (2017) Yanhao Yu et al. Nature Energy
- Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene
- (2016) Adrianus I. Aria et al. ACS Applied Materials & Interfaces
- Time as the Fourth Dimension: Opening up New Possibilities in Chemical Vapor Deposition
- (2016) Henrik Pedersen CHEMISTRY OF MATERIALS
- AxBAxB… pulsed atomic layer deposition: Numerical growth model and experiments
- (2016) Triratna Muneshwar et al. JOURNAL OF APPLIED PHYSICS
- Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition
- (2015) Simon D. Elliott et al. ADVANCED MATERIALS
- Influence of deposition temperature of thermal ALD deposited Al2O3 films on silicon surface passivation
- (2015) Neha Batra et al. AIP Advances
- A brief review of atomic layer deposition: from fundamentals to applications
- (2014) Richard W. Johnson et al. Materials Today
- Modeling ALD Surface Reaction and Process Dynamics using Absolute Reaction Rate Theory
- (2013) Curtisha D. Travis et al. CHEMICAL VAPOR DEPOSITION
- Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
- (2013) Ville Miikkulainen et al. JOURNAL OF APPLIED PHYSICS
- Modeling alumina atomic layer deposition reaction kinetics during the trimethylaluminum exposure
- (2013) Curtisha D. Travis et al. THEORETICAL CHEMISTRY ACCOUNTS
- Alucone Alloys with Tunable Properties Using Alucone Molecular Layer Deposition and Al2O3 Atomic Layer Deposition
- (2012) Byoung H. Lee et al. Journal of Physical Chemistry C
- Coking- and Sintering-Resistant Palladium Catalysts Achieved Through Atomic Layer Deposition
- (2012) Junling Lu et al. SCIENCE
- Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
- (2011) H. B. Profijt et al. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
- Surface Chemistry for Molecular Layer Deposition of Organic and Hybrid Organic−Inorganic Polymers
- (2009) Steven M. George et al. ACCOUNTS OF CHEMICAL RESEARCH
- Ultra-thin microporous–mesoporous metal oxide films prepared by molecular layer deposition (MLD)
- (2009) Xinhua Liang et al. CHEMICAL COMMUNICATIONS
- Atomic Layer Deposition: An Overview
- (2009) Steven M. George CHEMICAL REVIEWS
- Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3
- (2008) S. B. S. Heil et al. JOURNAL OF APPLIED PHYSICS
- Al2O3 Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry
- (2008) David N. Goldstein et al. Journal of Physical Chemistry C
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